Preferential sputtering of metal oxide mixture thin films

The demand for ion beam sputtering (IBS) coated substrates is growing. In order to find new fields of application for IBS coating technology, it is necessary to understand in detail the distributions of the involved particles in an industrial-scale reactive coating process. In pursuit of this goal, in the present investigation, profiles sputter-eroded from tantalum, silicon, and silicon dioxide targets by a low-energy broad ion beam (ion energy ≤ 1.9 keV, ion source RIM-20) are measured with a mechanical profilometer and compared. To approximate the discrete and two-dimensional erosion data accurately, an empirical function is developed. For an applied target tilt angle of 55°, the results indicate that the actual angle-dependent ion–solid interaction mechanisms at the atomic level have a rather subordinate role in the macroscopic surface modification of the target in terms of the qualitative distribution of the erosion profile. The applied process geometry seems to have a much larger impact. Furthermore, in the case of silicon, a linear erosion rate as a function of erosion time is observed. Thus, the form of the broad erosion profile does not seem to have a measurable effect on the erosion rate.

show abstract

Impact of ion species on ion beam sputtered Ta2O5 layer quality parameters and on corresponding process productivity: A preinvestigation for large-area coatings

Sakiew¹,

Schwerdtner²,

Jupé

et al. 2021

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

View full text Add to dashboard Cite

The demand for ion beam sputtering-coated substrates is growing. In order to introduce ion beam sputter deposition (IBSD) technology into new fields of application, the deposition area must be further increased. In this context, the ion species applied for the sputtering process is an important parameter. In the present investigation, an industrial scale IBSD process was characterized with respect to productivity and layer quality by varying the ion species. Ar, Kr, or Xe broad ion beams at an ion energy of 1.8 keV were used, and the evaluation was carried out on the basis of Ta2O5 layers. The dielectric films were produced in a reactive process through the sputtering of a metallic Ta target, and their two-dimensional distributions of the coating rate R, the refractive index [Formula: see text], and the extinction coefficient [Formula: see text] were determined over a planar area of 0.9 × 1.0 m2 above the target by the collection method. R served as a measure of productivity, while [Formula: see text] and [Formula: see text] were quality parameters. Additionally, the layer composition was determined for selected samples on the collector by an electron probe microanalyzer (EPMA). As expected, the different ion-solid interaction mechanisms resulted in significant differences with regard to productivity. Linear scaling of productivity as a function of ion mass was observed. Calculations of the sputtering yield with semiempirical models or SRIM-2013, a binary collision Monte Carlo simulation program, did not confirm the observed linearity. Furthermore, the configuration with the highest productivity, Xe, led to a locally occurring and significant reduction in layer quality, more precisely, an increase of [Formula: see text]. Additionally, the layer compositions determined with EPMA confirmed that ions originating from the ion source were implanted in the thin films during their formation. A detailed evaluation of the angle-resolved energy distributions of the involved particles, simulated with SRIM-2013, was performed. However, the determination of the energies carried away from the target by backscattered ions and sputtered target atoms does not explain the observed degradation mechanism. This concludes that for the realization of future large-area coatings with IBSD, not all relevant mechanisms are yet understood in sufficient detail.

show abstract

scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.

Contact Info

hi@scite.ai

10624 S. Eastern Ave., Ste. A-614

Henderson, NV 89052, USA

Blog Terms and Conditions API Terms Privacy Policy Contact Cookie Preferences Do Not Sell or Share My Personal Information

Made with 💙 for researchers

Part of the Research Solutions Family.

Preferential sputtering of metal oxide mixture thin films

Cited by 3 publications

References 23 publications

Morphological Stability Limits of Ag–Cu–Al Nanocrystalline Thin Films Prepared via Reactive Sputtering in Ar–O2 Mixed Gas

Morphological Stability Limits of Ag–Cu–Al Nanocrystalline Thin Films Prepared via Reactive Sputtering in Ar–O2 Mixed Gas

Investigation of target erosion profiles sputter-eroded by a low-energy broad ion beam

Impact of ion species on ion beam sputtered Ta2O5 layer quality parameters and on corresponding process productivity: A preinvestigation for large-area coatings

Contact Info

Product

Resources

About