Predictive Ratio Control for Interacting Processes

Tan, Kok Kiong; Tay, Arthur; Zhao, Shengyuan; Huang, Sunan; Lee, Tong Heng

doi:10.1021/ie900219u

Cited by 2 publications

(1 citation statement)

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“…As outline by the International Technology Roadmap for Semiconductors (ITRS) roadmap, there are currently no known manufacturing solutions and much work is required. The second approach is the development of algorithms , and more advanced thermal processing systems for temperature and CD control, which is the approach undertaken in this work.…”

Section: Introductionmentioning

confidence: 99%

Modeling and Real-Time Control of Multizone Thermal Processing System for Photoresist Processing

Tay

Chua

Wang

et al. 2013

Ind. Eng. Chem. Res.

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We present a real time, in situ method to control the spatial temperature uniformity of a semiconductor substrate during the various bake steps in the lithography sequence. Significantly, the wafer temperature settles down to steady state within 50 s under closed-loop control. The corresponding maximum temperature nonuniformity during transient is less than 1 °C and the steady state temperature nonuniformity is less than 0.1 °C. Specifically, we have developed a complete thermal diffusion model for the entire bake plate-and-wafer system, so that the transient thermal behavior is accurately captured during the baking process. By monitoring the bake plate temperature and fitting the data into the model, an updated model can be estimated and the desired wafer temperature can then be calculated and controlled in real time. Experimental results confirm the efficacy of the approach and its superiority over traditional run-to-run control techniques.

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Section: Introductionmentioning

confidence: 99%