Prediction of Pad Wear Profile and Simulation of Its Influence on Wafer Polishing
Pengjie Zheng,
Dewen Zhao,
Xinchun Lu
Abstract:As feature sizes decrease, an investigation of pad unevenness caused by pad conditioning and its influence on chemical mechanical polishing is necessary. We set up a kinematic model to predict the pad wear profile caused by only diamond disk conditioning and verify it. This model shows the influences of different kinematic parameters. To keep the pad surface planar during polishing or only conditioning, we can change the sweep mode and range of the conditioner arm. The kinematic model is suitable for the predi… Show more
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