2022
DOI: 10.1039/d2sc01538b
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Prediction and realisation of high mobility and degenerate p-type conductivity in CaCuP thin films

Abstract: Phosphides are interesting candidates for hole transport materials and p-type transparent conducting applications, capable of achieving greater valence band dispersion than their oxide counterparts due to the higher lying energy...

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Cited by 20 publications
(34 citation statements)
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References 85 publications
(104 reference statements)
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“…A recent report on thin-film CaCuP has a similar n H B 1.2  10 20 cm À3 , but a lower m H B 36 cm 2 V À1 s À1 compared to 100 cm 2 V À1 s À1 in this work. 25 Density of states effective mass, m à DoS ¼ N DoS for MgCuP is consistent with the published bandstructure. 17 MgCuP has a single band at the valence band maximum (VBM), which occurs at the G-point (N v = 1).…”
supporting
confidence: 86%
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“…A recent report on thin-film CaCuP has a similar n H B 1.2  10 20 cm À3 , but a lower m H B 36 cm 2 V À1 s À1 compared to 100 cm 2 V À1 s À1 in this work. 25 Density of states effective mass, m à DoS ¼ N DoS for MgCuP is consistent with the published bandstructure. 17 MgCuP has a single band at the valence band maximum (VBM), which occurs at the G-point (N v = 1).…”
supporting
confidence: 86%
“…A recent report on thin-film CaCuP reports a similar nH ~ 1.2 × 10 20 cm -3 , but a lower μH ~ 36 cm 2 .V -1 .s -1 compared to 100 cm 2 .V -1 .s -1 in this work. 25 Density of states effective mass, m*DoS = Nv 2/3 m*b values were determined using the single parabolic band (SPB) model. 26 m*DoS is an important fundamental electronic parameter that determines the magnitude of S and is linked to the total orbital and valley degeneracy (N v) and band mass (m*b) of the carriers.…”
mentioning
confidence: 99%
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“…A potential method for growing phosphorus-rich phosphide thin films is reactive sputtering. We have recently shown the feasibility of this deposition technique for various metal-rich phosphide compounds. …”
Section: Introductionmentioning
confidence: 99%
“…We have recently shown the feasibility of this deposition technique for various metal-rich phosphide compounds. [20][21][22] In this work, we demonstrate a relatively simple two-step process route to grow polycrystalline CuP 2 thin films as semiconductors of potential technological interest. First, reactive sputter deposition of amorphous CuP 2+x in a PH 3 -containing atmosphere; second, crystallization by rapid thermal annealing (RTA) in an inert atmosphere.…”
Section: Introductionmentioning
confidence: 99%