Precursors for CVD Growth of Nanocrystalline Diamond

Abstract

Variuos routes to grow nanocrystalline diamond films by chemical vapor deposition technique are reviewed. Among various routes, NCD films deposited on mirror polished silicon substrates by biased enhanced growth by microwave plasma chemical vapor deposition are described in detail. Qualitative concentration of NCD was assessed by Raman spectroscopy and X-ray diffraction patterns of the films. The hardness of the films approaches to that of natural diamond at optimized conditions while still having low amount of stress (< 1 GPa).