Precision fabrication of EUVL programmed defects with helium ion beam lithography

Lee, Chien-Lin; Cai, Jia-Syun; Chien, Shih‐Chang; Tsai, Kuen-Yu

doi:10.1117/12.2536874

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Milling For 3d Nanostructures1

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2021

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“…The direct-write HIB milling process can then pattern 1.5 nm structures by correcting the proximity effect. It can offers a promising alternative method for fabricating programmed defects and test structures for sub-7 nm advanced metrology solutions [66,67].…”

Section: Milling For 3d Nanostructuresmentioning

confidence: 99%

Helium-ion-beam nanofabrication: extreme processes and applications

He¹,

Tian²,

Wu³

et al. 2021

Int. J. Extrem. Manuf.

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Helium ion beam (HIB) technology plays an important role in the extreme fields of nanofabrication. This paper reviews the latest developments in HIB technology as well as its extreme processing capabilities and widespread applications in nanofabrication. HIB-based nanofabrication includes direct-write milling, ion beam-induced deposition, and direct-write lithography without resist assistance. HIB nanoscale applications have also been evaluated in the areas of integrated circuits, materials sciences, nano-optics, and biological sciences. This review covers four thematic applications of HIB: (1) helium ion microscopy imaging for biological samples and semiconductors; (2) HIB milling and swelling for 2D/3D nanopore fabrication; (3) HIB-induced deposition for nanopillars, nanowires, and 3D nanostructures; (4) additional HIB direct writing for resist, graphene, and plasmonic nanostructures. This paper concludes with a summary of potential future applications and areas of improvement for HIB extreme nanofabrication technology.

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Section: Milling For 3d Nanostructuresmentioning

confidence: 99%