2022
DOI: 10.1016/j.measurement.2021.110308
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Precise localization of contaminants in graphene with secondary ion mass spectrometry

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Cited by 8 publications
(2 citation statements)
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“…SIMS measurements were performed employing the CAMECA SC Ultra instrument equipped with an RF plasma O 2 + primary ion source. To achieve atomic depth resolution, a high incident angle bombardment (75 • ) was used, and the details of such experiments are presented elsewhere [72].…”
Section: Characterizationmentioning
confidence: 99%
“…SIMS measurements were performed employing the CAMECA SC Ultra instrument equipped with an RF plasma O 2 + primary ion source. To achieve atomic depth resolution, a high incident angle bombardment (75 • ) was used, and the details of such experiments are presented elsewhere [72].…”
Section: Characterizationmentioning
confidence: 99%
“…Therefore, these values are not used further. In order to investigate this contradiction Secondary Ion Mass Spectrometry (SIMS) analyses were carefully done at the 4H-SiC/Ti3SiC2-interface of sample A by using a CAMECA IMS SC Ultra SIMS tool which allows a sub-nm resolution [28,29]. The sub-nm depth resolution was achieved for O 2+ primary ions with an impact energy of 250 eV.…”
Section: Determination Of Schottky Barrier Heightmentioning
confidence: 99%