2021
DOI: 10.1021/acsanm.0c02712
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Precise Control of the Oxidation State of PbS Quantum Dots Using Rapid Thermal Annealing for Infrared Photodetectors

Abstract: We report the effect of oxidation on PbS quantum dot (QD) photodetectors using rapid thermal annealing (RTA) and furnace annealing in air at different durations and temperatures. Air-annealed QD films using RTA had an improved specific detectivity of up to 1.51 × 10 12 Jones with a responsivity of up to 1.895 × 10 3 A/W at 1 kHz. We used transient photocurrent decay measurements, Xray photoelectron spectroscopy, and frequency response measurements to investigate the origin of this effect. We found that short-t… Show more

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Cited by 15 publications
(9 citation statements)
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“…The effect of annealing on the photocurrent of devices may come from two main sources: one is the absorbance of films; the second is the oxidation degree of films. , The UV–vis spectra of PbS QDs-EDT films with different annealing temperatures are shown in Figure b. With the increase of annealing temperature, the absorbance of the device in the near-infrared region decreases to some extent, which may be due to the weakening of the quantum confinement caused by the diffusion process (necking or fusing) of nanocrystals. , In addition, annealing in air has an oxidizing effect on the PbS QDs-EDT films, especially on EDT ligands . Oxidation of EDT ligands forms a new interface between PbS and EDT which acts as a deep trap and charge extraction barrier, affecting the carrier mobility of films .…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…The effect of annealing on the photocurrent of devices may come from two main sources: one is the absorbance of films; the second is the oxidation degree of films. , The UV–vis spectra of PbS QDs-EDT films with different annealing temperatures are shown in Figure b. With the increase of annealing temperature, the absorbance of the device in the near-infrared region decreases to some extent, which may be due to the weakening of the quantum confinement caused by the diffusion process (necking or fusing) of nanocrystals. , In addition, annealing in air has an oxidizing effect on the PbS QDs-EDT films, especially on EDT ligands . Oxidation of EDT ligands forms a new interface between PbS and EDT which acts as a deep trap and charge extraction barrier, affecting the carrier mobility of films .…”
Section: Resultsmentioning
confidence: 99%
“…With the increase of annealing temperature, the absorbance of the device in the near-infrared region decreases to some extent, which may be due to the weakening of the quantum confinement caused by the diffusion process (necking or fusing) of nanocrystals. 36,37 In addition, annealing in air has an oxidizing effect on the PbS QDs-EDT films, especially on EDT ligands. 38 Oxidation of EDT ligands forms a new interface between PbS and EDT which acts as a deep trap and charge extraction barrier, affecting the carrier mobility of films.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
“…[87] Treatment with halide ligands such as cetyltrimethylammonium bromide (CTAB), tetrabutylammonium iodide (TBAI), and PbI 2 would be more effective than organic ligands. [34,[88][89][90] In 2011, Tang et al used inorganic ligands to effectively passivate the surface states of QDs for the first time to achieve high quality QD films. [34] They first introduced cadmiumtetradecyl phosphonic acid (Cd-TDPA) complex to the surface of PbS QDs, and then introduced Br − with CTAB to adhere to the surface cations (Figure 4c).…”
Section: Passivation Of Inorganic Ligandmentioning
confidence: 99%
“…[ 87 ] Treatment with halide ligands such as cetyltrimethylammonium bromide (CTAB), tetrabutylammonium iodide (TBAI), and PbI 2 would be more effective than organic ligands. [ 34,88–90 ]…”
Section: The Passivation Of Surface Defects and The Enhancements Of C...mentioning
confidence: 99%
“…Generally, the reported annealing methods were performed on the CQD film. However, the film annealing process is not only sensitive to atmospheric conditions but may also cause necking and sintering of particles. , Most importantly, the passivating ligands are desorbed from the CQDs during the film annealing process, which leads to the formation of vacancies and defects. Therefore, finding a controlled method to maintain the strengths and avoid the weaknesses of this annealing process remains an important but challenging task.…”
Section: Introductionmentioning
confidence: 99%