Abstract:Immersion lithography has gone through its first phase of introduction and acceptance as the main solution for critical layer lithography for 45nm node and beyond. In this phase, the industry has found that immersion technology has its own unique challenges associated with introducing water as a medium between the projection lens and wafer. Resist process qualification is once again under the spot light.Due to the rapid introduction of immersion technology resist suppliers did not have sufficient time to refor… Show more
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