2004
DOI: 10.1063/1.1644326
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Practical electron-tunneling refrigerator

Abstract: We demonstrate a thin-film, solid-state refrigerator based on the removal of hot electrons from a metal by quantum-mechanical tunneling. We have reduced the electronic temperature in a metal film from 260 to ∼130 mK. The base temperature of the device is predicted to increase to near 140 mK under a power load of 10 pW. Both the cooling power and temperature reduction of the refrigerator are well matched to practical applications. This refrigerator will make high-performance cryogenic photon sensors more access… Show more

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Cited by 59 publications
(49 citation statements)
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“…In this configuration, a reduction of the electron temperature from 300 to about 100 mK was obtained. Later on, other experimental evidence of electron cooling in SINIS metallic structures was reported ͑Fisher et Leoni et al, 1999Leoni et al, , 2003Vystavkin et al, 1999;Arutyunov et al, 2000;Luukanen et al, 2000;Pekola, Anghel, et al, 2000;Tarasov et al, 2003;Clark et al, 2004;Pekola, Heikkilä, et al, 2004͒. In these experiments NIS junc- FIG. 26.…”
Section: "Si…nis Structuresmentioning
confidence: 88%
“…In this configuration, a reduction of the electron temperature from 300 to about 100 mK was obtained. Later on, other experimental evidence of electron cooling in SINIS metallic structures was reported ͑Fisher et Leoni et al, 1999Leoni et al, , 2003Vystavkin et al, 1999;Arutyunov et al, 2000;Luukanen et al, 2000;Pekola, Anghel, et al, 2000;Tarasov et al, 2003;Clark et al, 2004;Pekola, Heikkilä, et al, 2004͒. In these experiments NIS junc- FIG. 26.…”
Section: "Si…nis Structuresmentioning
confidence: 88%
“…The effect can be made to be more pronounced in a symmetric double-junction SINIS structure with a small N island contacted to S leads via two NIS junctions, 15 allowing to construct practical solid-state refrigerators for cooling thin-film detectors to temperatures close to 100 mK. 16,17 The performance of actual devices depends crucially on the relaxation of the QPs that are injected into the S electrode, as the superconductor overheating diminishes the cooling power at a NIS junction because of enhanced QP backtunneling. The excess QP density close to the junction can be diminished by ©2011 American Physical Society fabricating very thick S electrodes, 16 or covering them partially by a layer of normal metal that acts as a QP trap.…”
mentioning
confidence: 99%
“…16,17 The performance of actual devices depends crucially on the relaxation of the QPs that are injected into the S electrode, as the superconductor overheating diminishes the cooling power at a NIS junction because of enhanced QP backtunneling. The excess QP density close to the junction can be diminished by ©2011 American Physical Society fabricating very thick S electrodes, 16 or covering them partially by a layer of normal metal that acts as a QP trap. [18][19][20] The QP population is typically modeled in terms of a diffusion equation, describing their recombination retarded by phonon retrapping, and other loss mechanisms.…”
mentioning
confidence: 99%
“…10 Although it is possible to have both NIN and NIS Al-based junctions in a single circuit by controlling the thicknesses and thus the critical fields of Al layers, 11 in some applications external fields cannot be tolerated. Another approach is to dope Al with, e.g., manganese impurities to control or diminish the T C while retaining the BCS density of states 6,12 but the junction quality could be compromised, 13 and it is undesirable to have both manganese-doped and pure superconducting materials in the same evaporator due to the risk of contamination. Also the use of inverse proximity effect arising in a normal metal-superconductor ͑NS͒ bilayer is a widely used technique for modifying the superconductor T C : 14,15 the normal metal gains a superconducting character while the superconductor gains normal metal features at a short distance from the interface.…”
mentioning
confidence: 99%
“…[3][4][5][6] A standard material for yielding high-quality junctions is aluminum due to rapid oxidation of its surface into a thin and stable layer of insulating aluminum oxide ͑AlO x ͒ under oxygen exposure. Aluminum is superconducting below the critical temperature T C = 1.2 K in bulk and up to 2.7 K in thin films.…”
mentioning
confidence: 99%