Practical Aspects in the Determination of Gaseous Elements by Radiofrequency Glow Discharge Atomic Emission Spectrometry

Hartenstein, Matthew L.; Marcus, R. Kenneth

doi:10.1039/a701428g

Cited by 20 publications

(14 citation statements)

References 18 publications

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“…All of the rf-GD depth profiles were performed on a Jobin-Yvon (Longjumeau, France) RF 5000 rf-GD-OES system located at Clemson University [38]. The instrument employs a Marcus-type rf-GD source geometry wherein the rf potential is applied through the back of the sample via a water-cooled backing disk.…”

Section: Methodsmentioning

confidence: 99%

“…The analysis sequence includes mounting of the sample against the vacuum sealing o-ring using the force of a pneumatic pistol applied to the back of the sample, initial evacuation of the source volume (~2 cm 3 ) to a base pressure of 10 mTorr (1.33 Pa) via a direct drive pump, and filling the discharge region to the desired operating pressure with purified Ar. While the purity of the discharge gas affects the overall sensitivity of the device, previous studies have shown that the use of a heated Zr-metal getter assembly is effective at purifying medium-grade (99.99% pure) Ar to the point where detection limits for nitrogen at the 1 ppm level are achieved [38]. The discharge is initiated and the rf power impedance-matched in real time under computer control.…”

Section: Methodsmentioning

confidence: 99%

“…Non-metals are determined with high sensitivity as well. For example, a detection limit of ~1 ppm has been achieved for determinations of nitrogen in steel matrices [38]. A comparison of sputtered crater shapes and depth profiles by Hoffmann and co-workers showed no appreciable differences between the two powering modes [39].…”

Section: Introductionmentioning

confidence: 99%

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Radio frequency glow discharge optical emission spectroscopy: a new weapon in the depth profiling arsenal

et al. 2002

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While the array of analytical methods routinely applied for depth profile analysis was fairly static over the decades of the 1980s and 1990s, there appears to be an emerging technique that has a number of very positive and complementary attributes, and warrants serious consideration by the thin film community. Radio frequency glow discharge optical emission spectroscopy (rf-GD-OES) is a technique that provides depth-resolved elemental composition information on a wide variety of sample types. In a manner very much like most depth profiling methods, the rf-GD plasma utilizes an ion sputtering step to ablate sample material in a layer-by-layer fashion. Different from the more commonly applied methods, the device operates at elevated pressures [2-10 Torr Ar (266-1,330 Pa)] and has the inherent capability of sputtering electrically insulating materials directly, without any auxiliary means of charge compensation. In addition, sputtering rates on the order of 1 micro m/min provide rapid analysis, with depth resolving powers that are comparable to high-vacuum sputtering methods. Three examples of the use of the rf-GD-OES method are presented as examples of its analytical potential: (1) boron-implanted silicon wafer, (2) a barrier-type alumina film, and (3) a porous-type alumina film. It is believed that the method holds a great deal of promise as part of the arsenal of weapons in the thin films laboratory.

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Section: Methodsmentioning

confidence: 99%

Section: Methodsmentioning

confidence: 99%

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Radio frequency glow discharge optical emission spectroscopy: a new weapon in the depth profiling arsenal

et al. 2002

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“…9 For instance, some studies show the effect of using ultrahigh purity argon for the determination of gas species in GD plasmas. 10,11 Particularly, limits of detection between 1 and 10 ppm can be obtained for nitrogen using radiofrequency glow discharge optical emission spectrometry using a heated metal (Zr) getter. 10 Also, part of these drawbacks could be overcome by minimising contaminants from the carrier gas or using a sacrificial material sputtered under the analysis conditions to clean the inner surface of the anode of the GD source.…”

Section: Introductionmentioning

confidence: 99%

A purged argon pre-chamber for analytical glow discharge—time of flight mass spectrometry applications

Lobo

Bordel

Pereiro

et al. 2011

J. Anal. At. Spectrom.

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Aiming at minimizing microleaks in the seal between the sample and the GD, a surrounding chamber which warrants a continuous isolating argon flow around the solid sample during the analysis, has been investigated for radiofrequency (rf) glow discharge (GD) coupled to time of flight mass spectrometry (TOFMS) applications. Three standard reference materials and two thin coatings were analysed comparing the influence of the purging pre-chamber in the analytical results, both in non-pulsed and pulsed rf-GD operation modes. Results show that the external argon flow seems to reduce the microleaks between the sample and the GD source since a diminished level of polyatomics appeared in the recorded mass spectra. Additionally, using the rf non-pulsed mode better signal reproducibility, less polyatomic interferences and, in some cases, higher ion signals could be achieved. In terms of in-depth profile capabilities, a faster penetration rate was observed when the pre-chamber was used and such difference was dependent on the sample composition. Comparatively, less benefit was apparent using the rf-pulsed mode as the temporal discrimination in such mode allows to separate analytical ion signals from interfering contaminants.

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“…1 -4 Methods developed for depth-resolved analyses have been reported for a wide range of materials, including painted and oxide coatings, metals and glasses and superlattice materials. 2,3 Experience has illustrated that sputter rate (depth) determination remains the single most significant source of uncertainty in quantitative measurements.…”

Section: Introductionmentioning

confidence: 99%

On-line determination of sputtered depth in a radio frequency glow discharge atomic emission source by laser confocal displacement

Hartenstein¹,

Marcus²

1999

Surf. Interface Anal.

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Practical Aspects in the Determination of Gaseous Elements by Radiofrequency Glow Discharge Atomic Emission Spectrometry

Cited by 20 publications

References 18 publications

Radio frequency glow discharge optical emission spectroscopy: a new weapon in the depth profiling arsenal

Radio frequency glow discharge optical emission spectroscopy: a new weapon in the depth profiling arsenal

A purged argon pre-chamber for analytical glow discharge—time of flight mass spectrometry applications

On-line determination of sputtered depth in a radio frequency glow discharge atomic emission source by laser confocal displacement

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