2020
DOI: 10.1109/access.2020.2970966
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Powernet: SOI Lateral Power Device Breakdown Prediction With Deep Neural Networks

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Cited by 43 publications
(25 citation statements)
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“…[6] proposed to use ML to replace TCAD simulation for device variation analysis and Ref. [7] used ML to replace TCAD simulation to for power device breakdown prediction. However, none of these frameworks has been verified with experimental data, which are usually non-ideal due to equipment limitation, extra variables, and measurement noise.…”
mentioning
confidence: 99%
“…[6] proposed to use ML to replace TCAD simulation for device variation analysis and Ref. [7] used ML to replace TCAD simulation to for power device breakdown prediction. However, none of these frameworks has been verified with experimental data, which are usually non-ideal due to equipment limitation, extra variables, and measurement noise.…”
mentioning
confidence: 99%
“…We use a normalization method to compress the structural parameters to (0, 1), and the process can eliminate the effect of unit and scale differences between input parameters in order to treat each class of input parameters equally, thereby increasing the prediction accuracy and efficiency of the ANN. Similar approaches to data pre-processing have been reported in papers related to machine learning [12,13].…”
Section: Methodsmentioning
confidence: 68%
“…Recently, machine learning techniques for predicting the electrical characteristic parameters of the semiconductor device have been booming due to their ability to learn the relationship between structural parameters and characteristics efficiently [8][9][10][11][12][13]. However, most work is limited to providing only one characteristic parameter, such as the threshold voltage of a junctionless nanowire transistor [11] or the breakdown voltage of a lateral power device [12]. As for those that can output multiple characteristics, the characteristic parameters are extracted from the current-voltage (I-V) curve and capacitance-voltage (C-V) curve, which still relies on human-intensive operation [13].…”
Section: Introductionmentioning
confidence: 99%
“…Recently, machine learning (ML)-based device optimization frameworks have been proposed to handle the complexity of the optimization of next-generation MOSFET devices [13]- [15]. ML can model the relationships between the design variables and device characteristics based on the data.…”
Section: Introductionmentioning
confidence: 99%
“…They optimized the feedback FETs by analyzing the gradient of the trained NN. In [14] and [15], the NN was trained using 1,510 TCAD simulations of lateral double-diffused MOS. The device was optimized by combining the NN with a Bayesian optimizer in a 4-dimensional (4D) design space.…”
Section: Introductionmentioning
confidence: 99%