Power supply for mid-frequency magnetron sputtering with a wide-range control of pulses parameters

Oskirko, V. O.; Zakharov, A Z; Solovyev, A. A.; Pavlov, A. P.; Работкин, С. В.

doi:10.1088/1742-6596/1488/1/012003

Cited by 3 publications

(3 citation statements)

References 12 publications

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“…The maximum ion current density is observed at 5 µs and shorter pulses. As we note in the Introduction, this effect was observed earlier in [20,22,34,35]. Table 2 presents the main discharge parameters used in these works.…”

Section: Comparison Of Present and Previous Experimental Datasupporting

confidence: 54%

“…The growth in the high current pulse frequency is compensated by the decrease in the MFMS pulse power. In [35], the pulse reduction from 80 to 15 µs resulted in a 130% growth in the average ion current density on the substrate. The pulse time reduction of the discharge current was accompanied by an increase in the pulse frequency and amplitude.…”

Section: Comparison Of Present and Previous Experimental Datamentioning

confidence: 99%

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Ion current density on the substrate during short-pulse HiPIMS

Oskirko

Kozhevnikov

Работкин

et al. 2023

Plasma Sources Sci. Technol.

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The probe method for the ion current density measurements and a theoretical calculations of the dynamics of neutral and charged plasma particles by ionization region model (IRM), are used to study high-power impulse magnetron sputtering (HiPIMS) short and ultra-short pulse discharges. The paper studies reasons for the increase in the average ion current density on the substrate at shorter pulses, when the average discharge power does not change. HiPIMS pulses are applied to the copper target at constant values of the average discharge power (1000 W) and the peak current (150 А), respectively, while the pulse time of the discharge voltage ranges from 4 to 50 µs. A power supply with low output inductance is designed to generate ultra-short pulses. It is shown that the discharge pulse time reduction leads to a multiple growth (from 2 to 7 mA/cm2) in the average ion current density onto the substrate and the growth in the peak intensity of Ar+, Cu+ and Cu2+ recorded by optical emission spectroscopy. A theoretical model of this effect is based on the spatially averaged IRM, which takes into account afterglow effects. According to theoretical calculations, the increase in the average ion current density onto the substrate is determined by the plasma dissipation in the ionized region after the pulse end. Also, explained is the decrease in the copper deposition rate from 180 to 60 nm/min with decreasing pulse time from 40 to 4 µs. A comparison of the experimental data and those obtained earlier, shows that the suggested dependences of the ion current density and deposition rate on the HiPIMS pulse time, are typical for discharge systems with different cathode materials and configurations, i.e., for single- and dual-magnetron systems. This indicates to a common nature of the phenomena observed and additionally confirms the results obtained.

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Section: Comparison Of Present and Previous Experimental Datasupporting

confidence: 54%

Section: Comparison Of Present and Previous Experimental Datamentioning

confidence: 99%

Ion current density on the substrate during short-pulse HiPIMS

Oskirko

Kozhevnikov

Работкин

et al. 2023

Plasma Sources Sci. Technol.

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“…Модификации HiPIMS с короткими (s-HiPIMS) и ультракороткими (us-HiPIMS) импульсами вызывают интерес, поскольку с их помощью удается снизить количество дуг и повысить скорость осаждения покрытия при сохранении высокого уровня ионизации распыленного материала [6][7][8][9]. В предыдущих работах [10][11][12] нами было обнаружено двукратное увеличение средней интегральной плотности ионного тока на подложку при фиксированной средней мощности разряда в результате уменьшения длительности импульсов до 6-8 мкс.…”

Section: Introductionunclassified

Магнетронное Распыление Меди Короткими Импульсами Высокой Мощности

Oskirko¹,

Zakharov²,

Работкин³

et al. 2022

8th International Congress on Energy Fluxes and Radiation Effects

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Представлены результаты магнетронного распыления меди короткими (до 1–2 мкс) импульсами высокой мощности. Для получения коротких импульсов использовался специальный источник питания, обладающий высоким выходным напряжением (до 1500 В) и низким внутренним сопротивлением. Результаты экспериментов показали, что уменьшение длительности импульсов разрядного тока ведет к увеличению средней плотности ионного тока, протекающего на подложку. Максимальная плотность ионного тока наблюдается при длительности импульсов разрядного тока 2–6 мкс. Показано, что благодаря увеличению плотности ионного тока существенно возрастает отношение количества ионов к количеству атомов в потоке частиц, воздействующих на подложку.

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