Powder Coatings via Atomic Layer Deposition for Batteries: A Review

Abstract

Rechargeable batteries have emerged as the most promising energy storage devices in response to continually growing modern demands and are still being researched to attain higher energy densities, structural stability, and longer cycling and calendar life. Owing to the fact that battery electrodes are developed from various types of powders, incorporation of functional nanocoating of suitable materials on powder materials and/or nanosynthesis of active powder constituents have shown promising results regarding the aforementioned challenges associated with modern battery technology. Atomic layer deposition (ALD) has been demonstrated to be highly effective in fabricating inorganic films even at the subnanoscale, not only on flat surfaces but also on individual particles with high conformity, uniformity, and self-limiting growth, thus providing exceptional control over film thickness. Unlike conventional wet-chemical processes, powder ALD offers a unique opportunity to develop nano- and subnanoscale films of various compositions over a variety of substrate particles regardless of their size, morphology, and composition. Proper modifications made by powder ALD process are known to induce improvements in structural stability, electronic and ionic conductivity at the interface, and consequent charge–discharge properties of the batteries. This review comprehensively covers the main strategies and materials used over time to improve the performance of various types of batteries utilizing the powder ALD process.

Atomic layer deposited high quality AlN thin films for efficient thermal management

“…Atomic layer deposition (ALD) is a highly versatile deposition method capable of growing conformal, uniform thin lms on complex three-dimensional or high aspect-ratio structures. [25][26][27] Using ALD, angstrom precision could be achieved via sequentially alternating self-limited gas-solid reactions. It has been considered an advanced technology to manufacture high quality lms in many elds ranging from microelectronics to energy storage devices.…”

Advances in Atomic Layer Deposition of Metal Sulfides: From a Precursors Perspective

“…16 Compared to the various other deposition methods, the ALD method has a higher potential in such applications especially those of semiconductors 17 and solar cell technologies. 18,19 The basic mechanism of ALD is that a substrate is successively exposed to a precursor and a counter reactant, each followed by a purging period. When exposed to the vapors of the precursor, chemisorption occurs on the surface of the substrate.…”

“…Bearing in mind, the exponential miniaturization of such applications paired with the demand for higher performance mandates better quality tools . Compared to the various other deposition methods, the ALD method has a higher potential in such applications especially those of semiconductors and solar cell technologies. , …”

Defect-type AlOxnanointerface boosting layered Mn-based oxide cathode for wide-temperature sodium-ion battery

“…Currently, surface coating could be one effective strategy for providing a stabilized interface structure for layered oxides, and the reported methods have included the wet chemical route, dry ball-mill coating, solid-state method and atomic layer deposition (ALD). 30–34 Using wet chemical treatment, many works have presented successful coatings of metal oxides (ZrO 2 , Al 2 O 3 , MgO, ZnO and CuO layers etc. ) on the surface of P2-type oxides.…”