Optical Microlithography XVIII 2005
DOI: 10.1117/12.600082
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Potential of solid immersion lithography using I-line and KrF light source

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Cited by 4 publications
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“…The solid immersion lens (SIL), invented by Mansfield and Kino in 1990 [1], has been widely used both in scientific research and industrial application, for example, optical storage [2][3][4][5], photolithography [6][7][8], and microscopy [9][10][11][12][13][14][15][16][17][18]. Due to the higher numerical aperture (NA) of a SIL, the SIL microscopy system provides not only higher spatial resolution and improved light collection efficiency, but also the capability of subsurface imaging with good resolution if the refractive index of the substrate is the same as that of the SIL.…”
Section: Introductionmentioning
confidence: 99%
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“…The solid immersion lens (SIL), invented by Mansfield and Kino in 1990 [1], has been widely used both in scientific research and industrial application, for example, optical storage [2][3][4][5], photolithography [6][7][8], and microscopy [9][10][11][12][13][14][15][16][17][18]. Due to the higher numerical aperture (NA) of a SIL, the SIL microscopy system provides not only higher spatial resolution and improved light collection efficiency, but also the capability of subsurface imaging with good resolution if the refractive index of the substrate is the same as that of the SIL.…”
Section: Introductionmentioning
confidence: 99%
“…Thus, it attracts potential applications in the field of imaging solidstate devices, which have most of the structures buried deep into the substrate. Many researchers also obtained improved resolution in experiments, by using SIL to avoid aberration due to the refractive index mismatch between air and the sample [3,4,8,[17][18][19][20][21].…”
Section: Introductionmentioning
confidence: 99%