This study investigated how the SiN x refractive index (RI) and SiO 2 thickness, d ox , of stacked SiN x /SiO 2 passivation layers of the front p + emitters of n-type crystalline-silicon (c-Si) photovoltaic (PV) cells affect their polarization-type potential-induced degradation (PID) behaviors. We prepared six n-type c-Si PV cells with an RI of 2.0 or 2.2 and with d ox of 9, 2, or 1 nm. Then PV modules fabricated from the cells were subjected to PID tests during which a bias of −1000 V was applied to cells with respect to the front cover glass surface.For d ox of 9 or 2 nm, rapid polarization-type PID was observed, irrespective of the RI. However, for d ox of 1 nm, the RI markedly affected the degradation behavior, and cells with an RI of 2.2 showed no degradation. These findings are attributable to carrier transport between the high RI (Si-rich) SiN x and the c-Si substrates, which can readily occur only when the SiO 2 layer is sufficiently thin for electrons to tunnel through the SiO 2 layer. These results are important for elucidating polarization-type PID mechanisms and for developing preventive measures against polarization-type PID.