2007
DOI: 10.1016/j.mssp.2006.06.001
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Post-deposition annealing effect on In2S3 thin films deposited using SILAR technique

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Cited by 29 publications
(18 citation statements)
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“…In 2 S 3 layers have been synthesized using a variety of chemical as well as physical techniques. These include chemical vapour deposition [6], atomic layer epitaxy [7], chemical spray pyrolysis (CSP) [8], chemical bath deposition [9], metal-organic chemical vapordeposition [10], thermal evaporation [11], and successive ionic layer adsorption and reaction [12,13]. In this study, In 2 S 3 films were formed on glass substrates by vacuum thermal evaporation.…”
Section: Introductionmentioning
confidence: 99%
“…In 2 S 3 layers have been synthesized using a variety of chemical as well as physical techniques. These include chemical vapour deposition [6], atomic layer epitaxy [7], chemical spray pyrolysis (CSP) [8], chemical bath deposition [9], metal-organic chemical vapordeposition [10], thermal evaporation [11], and successive ionic layer adsorption and reaction [12,13]. In this study, In 2 S 3 films were formed on glass substrates by vacuum thermal evaporation.…”
Section: Introductionmentioning
confidence: 99%
“…Barreau et al have reported similar results in the case of samples using CBD when the substrate is dipped for longer time in water [11]. XPS analysis on In 2 S 3 films, prepared using SILAR, also suggests that films prepared with longer dipping time in water contains more oxygen [20]. During the film formation with longer dipping time in water, the grain growth is also affected leading to small grains and poor crystallinity.…”
Section: Resultsmentioning
confidence: 64%
“…It has been reported earlier that indium sulfide films prepared using InCl 3 at room tem-perature through CBD and SILAR methods were also amorphous [16,19,20]. It was also reported that samples prepared using this method at deposition times 2s and 6s in precursor solution could be made crystalline upon annealing at 400 0 C [20]. Annealing temperature (Ta) is very important in the crystalline properties of the films.…”
Section: Resultsmentioning
confidence: 93%
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“…2,3,4,5 It is intrinsically an n-type 6,7 semiconductor with bandgap in the vicinity of 2.0 eV 1,12,15 . But there is still controversy on whether it is a direct 8,9 or indirect 10,11 bandgap material.…”
Section: Introductionmentioning
confidence: 99%