POSS-based glycidyl methacrylate copolymer for transparent and permeable coatings

Abstract

POSS-based GMA hybrid copolymers of P(GMA-MAPOSS) are prepared by methacrylisobutyl polyhedral oligomeric silsesquioxane (MAPOSS) and glycidyl methacrylate (GMA) via free radical polymerization used as coatings. Their morphologies and particle size distributions in CHCl 3 solution are characterized by transmission electron microscopy (TEM) and dynamic light scattering (DLS).The effect of MAPOSS content on surface wettability, transparency and permeability of casted films, the adhesive strength and thermostability of hybrid copolymers are further characterized by scanning electron microscopy (SEM), static contact angle (SCA), UV-Vis, mercury porosimeter, mechanical testing, differential scanning calorimetry (DSC) and thermogravimetry (TGA). Compared with homogeneous surface of PGMA film, the surface of P(GMA-MAPOSS) film exhibits heterogeneous morphology due to bulky volume of MAPOSS tending to agglomerate onto the film surface. This micro rough structure helps to enhance the surface hydrophobicity (100-112 ° water static contact angle). While, the surface of cured P(GMA-MAPOSS) film obtains a very homogeneous micro-rough morphology without any agglomeration due to the restricted movements of MAPOSS by 250 nm core-shell particles in CHCl 3 solution. Therefore, the cured P(GMA-MAPOSS) film provides with superior luminousness (>98%), strong adhesive strength (748.2 Pa) and high thermostability (T g =115 ℃). Particularly, the chemically involved MAPOSS into PGMA can effectually improve the permeability of traditional epoxy resin. It is believed that the POSS-based GMA hybrid copolymers P(GMA-MAPOSS) will have great potential applications as transparent and permeable coatings.

Europium/1,3,5-Benzenetricarboxylic Acid Metal–Organic Framework Nanorods Decorated with CdSe Quantum Dots as Coatings for Noncontact Ratiometric Optical Temperature Sensing

“…A POSSbased copolymer of glycidyl methacrylate was synthesized based on the procedure outlined in the literature. 51 A mixture of GMA (1.0 g), MAPOSS (0.4 g), and AIBN (1 wt %) was dissolved in anhydrous dibutyl ketone (2.8 g), followed by stirring at 70 °C for 8 h. Afterward, rotary evaporation was conducted to remove the excess solvent, and the residual colorless solution was reprecipitated into excess methanol and dried overnight in a vacuum oven to afford a white powder of P(GMA-MAPOSS). The P(GMA-MAPOSS) powder (10 wt %) and CdSe/Eu-BTC powder (6 wt %) were dissolved in toluene, followed by the dropwise addition of 1% mass fraction of PMDETA as a catalytic curing agent under continuous stirring for 30 min.…”

“…Furthermore, glycidyl methacrylate (GMA) and POSS have been combined into a POSS-based copolymer for use as a coating, and the fabricated material exhibited excellent thermal stability and adhesive strength. 51 It is therefore conceivable that such coatings should be preferable choices for sensors in the case that they are combined with sensing materials.…”

Epoxy Functional Porous POSS Microparticle Synthesis

“…Until now, the POSS hybrid structure was combined with epoxy functionality in many chemical routes to produce membranes, coating materials, fillers, or adhesives [1]. Epoxy networks were reinforced with POSS blending to obtain better thermal stability and surface properties [7][8][9]. In the study of Matejka et al, the epoxy-POSS hybrid network was prepared by utilizing mono epoxy-POSS or amine-POSS precursors incorporation with polymeric networks via chemically bound or physically admixed [10].…”

Hierarchically Ordered Structures of Rod–Rod Block Copolymers Containing Two Mesogen-Jacketed Liquid Crystalline Polymers

“…For example, a HEX phase having a lattice parameter of ∼20 nm along with a smectic A (SmA) liquid crystalline (LC) phase having a d -spacing value of ∼5.5 nm can be obtained through the microphase separation of the BCP and the self-assembly of the cyanobiphenyl groups in the side chains. − POSS motif is also one of the widely used nano-building blocks because it has etch selectivity to polymers and can transform into silicon oxide under the condition of oxygen plasma . Thus, BCPs containing POSS motifs attract the interests of researchers and are utilized in the field of nanoporous films and nanopatterning. ,− Such BCPs form ordered microphase-separated structures with sizes of 10–100 nm, while the POSS motifs form a crystalline structure on ∼1 nm length scale.…”