Positive Working Photoresists Containing Tetrahydropyranyl Ester as an Acid Labile Residue for Relief Holograms.

Ohe, Yasushi; Iwata, Fujio; Ichimura, Kunihiro

doi:10.2494/photopolymer.5.573

Cited by 5 publications

(5 citation statements)

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“…In contrast, "positive-tone" media are solid-state systems for which the exposed regions become soluble in a developer. [19][20][21] The final structure is then the inverse of the exposure pattern. Positive-tone 3DM is desirable for a number of applications.…”

Section: Polymer Systems For Multi-photon 3d Microfabricationmentioning

confidence: 99%

CAD-integrated system for automated multi-photon three-dimensional micro- and nano-fabrication

et al. 2005

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Multi-photon three-dimensional micro-/nano-fabrication (3DM) is a powerful technique for creating complex 3D microscale structures of the type needed for micro-electromechanical systems (MEMS), micro-optics, and microfluidics. In 3DM high peak-power laser pulses are tightly focused into a medium which undergoes a physical or chemical change following multi-photon excitation at the focal point. Complex structures are generated by serial 3D-patterned exposure within the material volume. To further the application of 3DM to micro-component engineering, we are developing a fully automated and integrated 3DM system capable of creating complex cross-linked polymer structures based on patterns designed in a CAD environment. The system consists of four major components: (1) a femtosecond laser and opto-mechanical system; (2) 3-axis micro-positioner; (3) a computer-controlled fabrication interface; and (4) software for fabrication-path planning. The path-planning software generates a 3DM command sequence based on an objectdesign input file created using standard commercial CAD software. The 3DM system can be used for start-to-finish design and fabrication of waveguides, 3D photonic crystals, and other complex micro-structures. These results demonstrate a technological path for implementing 3DM as a tool for micro-and nano-optical component manufacture.

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Section: Polymer Systems For Multi-photon 3d Microfabricationmentioning

confidence: 99%

CAD-integrated system for automated multi-photon three-dimensional micro- and nano-fabrication

et al. 2005

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“…[3] For the reaction mechanism between sensitizing dyes and TAZ 114, DITS and DITFMS, we consider that it was electron transfer reaction as several reports. [1][2][3][4] When TAZI 14 is used as PAG, the relative order of sensitization of the sensitizing dye was acridine orange > KCD > thioxanten-9-one > rose bengal. However, there is a disadvantage that acridine orange reacts with TAZ 114 in dark.…”

Section: Photosensitivitymentioning

confidence: 99%

“…Hotta et al [3] reported that the negative-working photoresist consisting of PHS and hexamethoxy methylmelamine crosslinker and photoacid generator (PAG), which is high sensitivity to 488-nm argon ion Jr light based on cationic polycondensation. Ohe et al [4] reported the positive-working photoresist consisting of poly(tetrahydropyranyl methacrylates) activated by dye-sensitized decomposition of diphenyliodonium salt with high sensitivity.…”

Section: Introductionmentioning

confidence: 99%

Visible Laser Recordable Photopolymer Based on Poly(p-hydroxystyrene) and Acidolysis of Crosslinked Vinyl Ether.

Noppakundilograt

Miyagawa

Takahara

et al. 1999

J. Photopol. Sci. Technol.

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Positive-working photoresists based on poly(p-hydroxystyrene) (PHS), 2,2-bis[4-(2-(vinyloxy)ethoxy)phenyl] propane (BPA-DEVE) has been investigated on their sensitivities to 488-nm argon ion laser using binary acid generated system. 2-(2',4'-dimethoxystyryl)-4,6-bis(trichloromethyl)-1,3,5-tnazine (TAZ114), diphenyliodonium p-toluenesulfonate (DITS) and diphenyliodonium trifluoromethanesulfonate (DITFMS) were used as photoacid generator. Acridine orange, rose bengal, thioxanten-9-one and 3,3'-carbonylbis(7,7'-diethylaminocoumarin) (KCD) were used as sensitizing dye. In these photopolymers, the polymer containing of TAZ 114 and acridine orange exhibits the highest sensitivity to 488-nm light at 147.5 mJ1cm2.

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“…The mixture was stirred for 30 min at 0°C. ratio 4: 1) as an eluent gave 2-(7-hydroxyhexyl)-4,5-diphenyl-1,3-oxazole (3,82 2,05 (s; 1 H, -OH), 1,l-2,0 (m; lOH, -CH,-). Subsequently, a solution of 6-iodohexyl tetrahdropyranyl ether (5,82 g, 18,6 mmol) in THF (10 mL) was added.…”

Section: -(7-methacryloyloxyheptyl)-45-diphenyl-13-oxazole (Oxm-7)mentioning

confidence: 99%

A novel imaging system by dye‐sensitized photooxidation of oxazole groups attached to a polymer backbone, 4. Effect of oxazole content and spacer length

Ito

Ichimura

1995

Macro Chemistry & Physics

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Oxazole derivatives attached to a polymer backbone were transformed efficiently to the corresponding triacylamide compounds in a thin film by photooxidation using various dyes as photosensitizers. This photoinduced transformation proved to be applicable to a photoresist with positive tone and a holographic grating formation by development with an aqueous solution of amines to dissolve exposed areas of the film. In this system, the length of the methylene chain connecting the oxazole ring to the polymer backbone and the content of oxazole units in the polymer influence the efficiency of the image formation as well as development conditions.

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Positive Working Photoresists Containing Tetrahydropyranyl Ester as an Acid Labile Residue for Relief Holograms.

Cited by 5 publications

References 0 publications

CAD-integrated system for automated multi-photon three-dimensional micro- and nano-fabrication

CAD-integrated system for automated multi-photon three-dimensional micro- and nano-fabrication

Visible Laser Recordable Photopolymer Based on Poly(p-hydroxystyrene) and Acidolysis of Crosslinked Vinyl Ether.

A novel imaging system by dye‐sensitized photooxidation of oxazole groups attached to a polymer backbone, 4. Effect of oxazole content and spacer length

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