Porous Silicon: From Formation to Applications: Optoelectronics, Microelectronics, and Energy Technology Applications, Volume T 2016
DOI: 10.1201/b19042-12
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Porous Silicon as Host and Template Material for Fabricating Composites and Hybrid Materials

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Cited by 4 publications
(4 citation statements)
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“…A detailed description of the mesoporous silicon fabrication and structure can be found in Reference [ 55 ]. Mesoporous silicon has mostly been used as a host for the creation of ordered nanostructures of other materials [ 56 , 57 ]. This is caused by the highly ordered skeletons of the mesoporous silicon itself which defines the shape and sizes of the structures of the guest materials introduced into/onto the porous layer.…”
Section: What Is Porous Silicon?mentioning
confidence: 99%
“…A detailed description of the mesoporous silicon fabrication and structure can be found in Reference [ 55 ]. Mesoporous silicon has mostly been used as a host for the creation of ordered nanostructures of other materials [ 56 , 57 ]. This is caused by the highly ordered skeletons of the mesoporous silicon itself which defines the shape and sizes of the structures of the guest materials introduced into/onto the porous layer.…”
Section: What Is Porous Silicon?mentioning
confidence: 99%
“…The open structure of PS has driven scientists to introduce various "foreign" substances (such as metals and semiconductors) into its pores, in pursuit of creating nanocomposites and hybrid materials with electrophysical properties not akin to monocrystalline silicon [1]. In cases such as these PS plays the role of a "host" material, with the pore-filling material serving as a "guest".…”
Section: Introductionmentioning
confidence: 99%
“…The open cavities and very large surface area of porous silicon (PS) offer tempting prospects for its use as a structural matrix to create various nanocomposites and alloys [1] . PS layers can be formed on silicon substrates by a variety of electrochemical and chemical processing techniques, the most common one being electrochemical anodization in HF solutions [2] .…”
Section: Introductionmentioning
confidence: 99%
“…PS layers can be formed on silicon substrates by a variety of electrochemical and chemical processing techniques, the most common one being electrochemical anodization in HF solutions [2] . To obtain PS-based nanocomposites and compounds, various metals and their alloys can be deposited into the pore channels [1] . From a practical point of view, deposition of semiconductors into PS also presents a significant interest.…”
Section: Introductionmentioning
confidence: 99%