2004
DOI: 10.1557/jmr.2004.19.1.380
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Pop-in events induced by spherical indentation in compound semiconductors

Abstract: Details of the elastic–plastic transitions in crystalline compound semiconductors have been examined using spherical indentation. Two cubic (InP and GaAs) and two hexagonally structured semiconductors (ZnO and GaN) have been studied. A series of indentations have been made in each material at a number of different loads. The resulting load–penetration curves exhibited one or more discontinuities on loading (so called pop-in events). The load at which the initial pop-in event occurred has been measured along wi… Show more

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Cited by 96 publications
(69 citation statements)
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“…Additionally, this investigation suggests that dislocations nucleate first at the surface and then propagate inside the bulk, which can be an explanation for the so-called pop-in effect in InP indentation. [10][11][12]32 Finally, in opposition to the general beliefs (scratching tests create too many damages), we prove in this article that scratching is a suitable method to control dislocation nucleation inside a crystalline material.…”
Section: Introductionmentioning
confidence: 71%
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“…Additionally, this investigation suggests that dislocations nucleate first at the surface and then propagate inside the bulk, which can be an explanation for the so-called pop-in effect in InP indentation. [10][11][12]32 Finally, in opposition to the general beliefs (scratching tests create too many damages), we prove in this article that scratching is a suitable method to control dislocation nucleation inside a crystalline material.…”
Section: Introductionmentioning
confidence: 71%
“…[9][10][11][12] In this work, the first case can be disregarded as the approach velocity is identical for all indentation tests and no dislocations are generated up to a load of 1 mN. The latter case is observed for tests conducted at loads higher than 2 mN since all indents having a pop-in the load-displacement curves were etched indicating that dislocation nucleation had occurred.…”
Section: Discussionmentioning
confidence: 99%
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“…Once the maximal shearing stress at the surface under the tip has reached a critical value, dislocation nucleation may take place which is related to the so-called pop-in in indention force-penetration curves on III±V semiconductors. [21,22] The response of a material during scratching can change drastically when a thin layer is added on the surface. For instance, for a given tip radius and by using the proper load, it is possible to remove selectively an oxide at the surface of a silicon wafer without generating dislocations or phase transformations.…”
Section: Semiconductor Nano-scratchingmentioning
confidence: 99%
“…1,2 As being usually fabricated into low-dimensional piezoelectric devices, it is necessary to measure the mechanical properties of singlecrystal ZnO by contact-induced deformation through nanoindentation. [3][4][5][6][7][8][9][10][11][12][13] In this regard, the timedependent (so called creep) behavior is especially important in order to assess its mechanical reliability during devices being on service under long-term stress conditions. However, only few researches have been performed on the topic of nanoscale creep behavior of single-crystal ZnO with vertically (0001) orientation.…”
Section: Introductionmentioning
confidence: 99%