Photoswitches have long been employed in coatings for
surfaces
and substrates to harness light as a versatile stimulus to induce
responsive behavior. We previously demonstrated the viability of arylazopyrazole
(AAP) as a photoswitch in self-assembled monolayers (SAMs) on silicon
and glass surfaces for photoresponsive wetting applications. We now
aim to transfer the excellent photophysical properties of AAPs to
polymer brush coatings. Compared to SAMs, polymer brushes offer enhanced
stability and an increase of the thickness and density of the functional
organic layer. In this work, we present thiolactone acrylate copolymer
brushes which can be post-modified with AAP amines as well as hydrophobic
acrylates, making use of the unique chemistry of the thiolactones.
This strategy enables photoresponsive wetting with a tuneable range
of contact angle change on glass substrates. We show the successful
synthesis of thiolactone hydroxyethyl acrylate copolymer brushes by
means of surface-initiated atom-transfer radical polymerization with
the option to either prepare homogeneous brushes or to prepare micrometer-sized
brush patterns by microcontact printing. The polymer brushes were
analyzed by atomic force microscopy, time-of-flight secondary ion
spectrometry, and X-ray photoelectron spectroscopy. Photoresponsive
behavior imparted to the brushes by means of post-modification with
AAP is monitored by UV/vis spectroscopy, and wetting behavior of homogeneous
brushes is measured by static and dynamic contact angle measurements.
The brushes show an average change in static contact angle of around
13° between E and Z isomer
of the AAP photoswitch for at least five cycles, while the range of
contact angle change can be fine-tuned between 53.5°/66.5°
(E/Z) and 81.5°/94.8°
(E/Z) by post-modification with
hydrophobic acrylates.