Abstract:In this paper, a method that combines radio frequency (RF) plasma with hot filament (HF) chemical vapor deposition (CVD) together has been used to prepare 3C-SiC film. The samples obtained through the above method have been systematically demonstrated by atom force microscopy (AFM), x-ray diffraction (XRD).Its concentration is measured to be p=1.33 10 17 cm -3 using Hall effect. The samples have been divided into two parts: ones ohmic contact is made with deposition of aluminum directly on its surface. Alterna… Show more
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