Polymer Pen Lithography

Huo, Fengwei; Zheng, Zijian; Zheng, Gengfeng; Giam, Louise R.; Zhang, Hua; Mirkin, Chad A.

doi:10.1126/science.1162193

Cited by 501 publications

(616 citation statements)

References 28 publications

(38 reference statements)

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“…4. 54 The elastomeric tips can print a digitized pattern with spot sizes ranging from 90 nm to over 10 μm, simply by changing the force and time over which the ink is delivered. This feature-size dependence on force is a remarkably controllable parameter and distinguishes PPL from both DPN and conventional contact printing.…”

Section: Dip-pen Nanolithographymentioning

confidence: 99%

Additive nanomanufacturing – A review

et al. 2014

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Section: Dip-pen Nanolithographymentioning

confidence: 99%

Additive nanomanufacturing – A review

et al. 2014

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“…For high‐resolution nanopatterns a number of techniques are well developed, including electron‐/ion‐beam‐based lithography1, 2, 3 and tip‐based lithography,4, 5, 6, 7, 8, 9 but they are often too slow for wafer‐scale processes that demand fast processing times. On the other hand, for large‐area nanopatterning, optical/plasmonic lithography,10, 11, 12, 13, 14, 15 contact printing‐based lithography,16, 17, 18, 19 and template‐assisted lithography20, 21, 22, 23 are promising candidates; however, they require additional expensive and time‐consuming pre‐fabrication processes, such as the preparation of a master template. Colloidal lithography including nanosphere lithography (NSL),24 nanoparticle lithography,25, 26 and block copolymer micelle nanolithography (BCML)27 are attractive large‐scale parallel patterning methods that permit time‐ and cost‐effective patterning at the wafer‐scale.…”

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confidence: 99%

Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications

et al. 2015

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“…This AFM-based ink deposition process is generally referred to as dip pen nanolithography (DPN) 18 and enables patterning of a wide range of materials ("inks") including small organic molecules, 19 biomolecules, 20 metal nanoparticles, 21,22 and conducting polymers. 23−25 Its range of feature size resolution (from tens of nanometers up to several micrometers), ability to simultaneously pattern multiple inks, 26 upscalability, 27 and versatility in nondestructive lithography on substrates including semiconductors, plastics, biomaterials, and even biological tissue, 28 mean DPN is a promising tool for the nanostructuring of future nanoelectronic devices.…”

Section: ■ Introductionmentioning

confidence: 99%

Vapor Phase Polymerization of EDOT from Submicrometer Scale Oxidant Patterned by Dip-Pen Nanolithography

et al. 2012

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Some of the most exciting recent advances in conducting polymer synthesis have centered around the method of vapor phase polymerization (VPP) of thin films. However, it is not known whether the VPP process can proceed using significantly reduced volumes of oxidant and therefore be implemented as part of nanolithography approach. Here, we present a strategy for submicrometer scale patterning of the conducting polymer poly(3,4-ethylenedioxythiophene) (PEDOT) via in situ VPP. Attolitre (10 -18 L) volumes of oxidant "ink" are controllably deposited using dip-pen nanolithography (DPN). DPN patterning of the oxidant ink is facilitated by the incorporation of an amphiphilic block copolymer thickener, an additive that also assists with stabilization of the oxidant. When exposed to EDOT monomer in a VPP chamber, each deposited feature localizes the synthesis of conducting PEDOT structures of several micrometers down to 250 nm in width. PEDOT patterns are characterized by atomic force microscopy (AFM), conductive AFM, two probe electrical measurement, and micro-Raman spectroscopy, evidencing in situ vapor phase synthesis of conducting polymer at a scale (picogram) which is much smaller than that previously reported. Although the process of VPP on this scale was achieved, we highlight some of the challenges that need to be overcome to make this approach feasible in an applied setting. ABSTRACT: Some of the most exciting recent advances in conducting polymer synthesis have centered around the method of vapor phase polymerization (VPP) of thin films. However, it is not known whether the VPP process can proceed using significantly reduced volumes of oxidant and therefore be implemented as part of nanolithography approach. Here, we present a strategy for submicrometer scale patterning of the conducting polymer poly(3,4-ethylenedioxythiophene) (PEDOT) via in situ VPP. Attolitre (10 −18 L) volumes of oxidant "ink" are controllably deposited using dip-pen nanolithography (DPN). DPN patterning of the oxidant ink is facilitated by the incorporation of an amphiphilic block copolymer thickener, an additive that also assists with stabilization of the oxidant. When exposed to EDOT monomer in a VPP chamber, each deposited feature localizes the synthesis of conducting PEDOT structures of several micrometers down to 250 nm in width. PEDOT patterns are characterized by atomic force microscopy (AFM), conductive AFM, two probe electrical measurement, and micro-Raman spectroscopy, evidencing in situ vapor phase synthesis of conducting polymer at a scale (picogram) which is much smaller than that previously reported. Although the process of VPP on this scale was achieved, we highlight some of the challenges that need to be overcome to make this approach feasible in an applied setting.

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Polymer Pen Lithography

Cited by 501 publications

References 28 publications

Additive nanomanufacturing – A review

Additive nanomanufacturing – A review

Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications

Vapor Phase Polymerization of EDOT from Submicrometer Scale Oxidant Patterned by Dip-Pen Nanolithography

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