2015
DOI: 10.1063/1.4929461
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Polymer/metal oxide hybrid dielectrics for low voltage field-effect transistors with solution-processed, high-mobility semiconductors

Abstract: Transistors for future flexible organic light-emitting diode (OLED) display backplanes should operate at low voltages and be able to sustain high currents over long times without degradation. Hence, high capacitance dielectrics with low surface trap densities are required that are compatible with solution-processable high-mobility semiconductors. Here, we combine poly(methyl methacrylate) (PMMA) and atomic layer deposition hafnium oxide (HfOx) into a bilayer hybrid dielectric for field-effect transistors with … Show more

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Cited by 54 publications
(51 citation statements)
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“…A hybrid dielectric, consisting of ~11 nm poly(methyl methacrylate) (PMMA) and a ~61 nm layer of hafnium oxide (HfOx) on top, was chosen to achieve low gate leakage currents and to permit low-voltage operation. 47 To complete the devices, a semi-transparent 20 nm silver gate electrode was thermally evaporated onto the dielectric through a shadow mask. All devices exhibited ambipolar charge transport with low leakage currents and high on/off ratios on the order of 10 5 -10 6 as shown in the transfer characteristics at low source-drain bias (Vd = -0.1 V¸ Figure 1e) and the respective output curves (see Supporting Information, Figure S4).…”
Section: Resultsmentioning
confidence: 99%
“…A hybrid dielectric, consisting of ~11 nm poly(methyl methacrylate) (PMMA) and a ~61 nm layer of hafnium oxide (HfOx) on top, was chosen to achieve low gate leakage currents and to permit low-voltage operation. 47 To complete the devices, a semi-transparent 20 nm silver gate electrode was thermally evaporated onto the dielectric through a shadow mask. All devices exhibited ambipolar charge transport with low leakage currents and high on/off ratios on the order of 10 5 -10 6 as shown in the transfer characteristics at low source-drain bias (Vd = -0.1 V¸ Figure 1e) and the respective output curves (see Supporting Information, Figure S4).…”
Section: Resultsmentioning
confidence: 99%
“…Significantly, there exist multiple reports demonstrating a dielectric dependence to the charge mobility of semiconductors. 11,12 Yet, the mechanisms used to explain these differences vary greatly, from templated growth, 13 to interfacial trap states, 14 and planarization of the interface. 15 In this work, we present a direct comparison of In 2 O 3 TFTs and dielectric-only capacitors, produced with single and double layers of three different materials namely; AlO x , HfO x and ZrO x .…”
Section: © 2018 Author(s) All Article Content Except Where Otherwismentioning
confidence: 99%
“…11,12,15 Each of these three mechanisms 2018) can affect the carrier mobility within the channel of a TFT, and all are dependent on the quality of the interface between the dielectric and semiconductor. Interface trap states are specifically due to the bonding interaction between semiconductor and dielectric.…”
Section: © 2018 Author(s) All Article Content Except Where Otherwismentioning
confidence: 99%
“…Here we used an ambipolar LEFET structure and integrated it in a planar Fabry–Pérot microcavity as schematically shown in Figure b. After evaporation of the gold bottom mirror on a glass substrate, an insulating AlO x spacer layer was deposited, gold source and drain electrode were patterned, followed by spin‐coating of the DPPT‐BT, deposition of the hybrid poly[methyl methacrylate](PMMA)/hafnium oxide (HfO x ) dielectric and a silver top gate that also acted as the top mirror.…”
Section: Resultsmentioning
confidence: 99%