“…Reactive patterning techniques include photochemical patterning [1,[6][7][8], areaselected polymerization on electrodes modified with a patterned self-assembled monolayer SAM, by microcontact printing (lCP) method [7,[9][10][11][12][13][14], electro-deposition within channels between two electrodes [1,[15][16][17][18], microlithography by Scanning Electro-Chemical Microscope (SECM) [1,7,19,20], electrochemical dip-pen nanolithography (E-DPN) [1,21,22], template assisted synthesis [1,5], soft lithography assisted synthesis [23][24][25][26]. While non-reactive patterning techniques include but not limited to electronbeam writing [27] laser writing [28,29] screen printing [7,30], ink-jet printing [7,31,32], soft lithography [7,33] and nanoimprint lithography [34][35][36].…”