2005
DOI: 10.1016/j.orgel.2005.04.003
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Polymer field effect transistors made by laser patterning

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Cited by 25 publications
(17 citation statements)
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“…Laser-pattern is employed for the production of polymeric semiconductors and insulators on flexible polymeric substrates field effect transistors (PFETs) [10]. By defining planar nanostructures on polymer surfaces, it is possible to improve the parameters in polymer electronic memories [11].…”
Section: Introductionmentioning
confidence: 99%
“…Laser-pattern is employed for the production of polymeric semiconductors and insulators on flexible polymeric substrates field effect transistors (PFETs) [10]. By defining planar nanostructures on polymer surfaces, it is possible to improve the parameters in polymer electronic memories [11].…”
Section: Introductionmentioning
confidence: 99%
“…Mechanical methodologies include lithography lift-off, [12] microcutting, [13] and laser ablation. [14] Subtractive chemical patterning has been demonstrated by ink-jet printing of deactivation agents, [15,16] and etching/over-oxidation after lithographic patterning with photoresist. [3,17] Ink-jet printing has the same resolution limits as in additive patterning, while the use of lithography requires expensive clean room processing.…”
mentioning
confidence: 99%
“…Reactive patterning techniques include photochemical patterning [1,[6][7][8], areaselected polymerization on electrodes modified with a patterned self-assembled monolayer SAM, by microcontact printing (lCP) method [7,[9][10][11][12][13][14], electro-deposition within channels between two electrodes [1,[15][16][17][18], microlithography by Scanning Electro-Chemical Microscope (SECM) [1,7,19,20], electrochemical dip-pen nanolithography (E-DPN) [1,21,22], template assisted synthesis [1,5], soft lithography assisted synthesis [23][24][25][26]. While non-reactive patterning techniques include but not limited to electronbeam writing [27] laser writing [28,29] screen printing [7,30], ink-jet printing [7,31,32], soft lithography [7,33] and nanoimprint lithography [34][35][36].…”
Section: Introductionmentioning
confidence: 99%