2012
DOI: 10.3762/bjnano.3.71
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Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers

Abstract: SummaryA rapid and cost-effective lithographic method, polymer blend lithography (PBL), is reported to produce patterned self-assembled monolayers (SAM) on solid substrates featuring two or three different chemical functionalities. For the pattern generation we use the phase separation of two immiscible polymers in a blend solution during a spin-coating process. By controlling the spin-coating parameters and conditions, including the ambient atmosphere (humidity), the molar mass of the polystyrene (PS) and pol… Show more

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Cited by 48 publications
(63 citation statements)
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“…Fundamental characteristics of film formation, structure, and properties of self-assembled monolayers (SAMs) of organothiol molecules with aliphatic [1e11] backbones on metal surfaces, in particular on Au(111), have attracted significant attention because of their applications in molecular technologies [12], biosensorics [13e15], electrochemistry [16,17], lithography [18,19], and lubrication [20]. Subsequently, aromatic SAMs have also moved into the focus of interest [21e31] because their remarkable electronic properties that offer potential applications in a variety of fields such as in molecular electronics [32e34] and electronic interfaces [35,36].…”
Section: Introductionmentioning
confidence: 99%
“…Fundamental characteristics of film formation, structure, and properties of self-assembled monolayers (SAMs) of organothiol molecules with aliphatic [1e11] backbones on metal surfaces, in particular on Au(111), have attracted significant attention because of their applications in molecular technologies [12], biosensorics [13e15], electrochemistry [16,17], lithography [18,19], and lubrication [20]. Subsequently, aromatic SAMs have also moved into the focus of interest [21e31] because their remarkable electronic properties that offer potential applications in a variety of fields such as in molecular electronics [32e34] and electronic interfaces [35,36].…”
Section: Introductionmentioning
confidence: 99%
“…The incorporation of the Ag nanoparticles into the binary polymer blend system causes the disappearance of pits; instead, surface bumps are developed. The light bumps may refer to PS-rich domains [6]. The size of surface feature is reduced from 4.5 (pits) to 0.4 (bumps) mm.…”
Section: Synthesis Of Ps-pmma and Ag-ctab Nanoparticle Compositementioning
confidence: 99%
“…These blends have been intensively studied over the past two decades and allow the formation of complex layered or lateral micro-or nanoscale structures [5]. For instance, Huang et al prepared a spin-coat film of PS-PMMA with a pitted surface morphology [6]. The continuous PMMA phase was selectively dissolved and the remaining PS pits were used as a lift-off mask for the formation of a nanopatterned functional silane monolayer.…”
Section: Introductionmentioning
confidence: 99%
“…These islands were then back-filled by exposure to the vapor of 3-(aminopropyltriethoxy)-silane (Sigma-Aldrich). Further details and important parameters of the polymer-blend lithography process are described in [32]. The resulting pattern, consisting of amino-functionalized islands in a Teflon-like matrix (Figure 1b-d), was used as a template for the mineralization.…”
Section: Fabrication Of Sam Templatesmentioning
confidence: 99%