Polymer‐assisted deposition of perovskite dielectric oxide thin films

Abstract

Perovskite dielectric oxide thin films are tremendously important because of their promising applications in microelectronics and optic-electronic devices. Towards scalable applications of these materials, the development of wellcontrolled and cost-effective fabrication techniques is still under development. Here, recent progresses in the fabrication of perovskite dielectric oxide thin films by using a generic chemical solution deposition technique named polymer-assisted deposition (PAD) are reviewed. In this technique, metal ions are bonded to water-soluble polymers, forming stable and homogeneous precursor solutions of metallic ions surrounded by polymers which prevent hydrolysis of metal ions. Fabrication of the perovskite dielectric oxide thin films using the PAD technique, both on single crystal substrates and base metallic substrates, has been realised with good controllability. The qualities of the films are comparable with those of the ones prepared by physical-vapour deposition techniques.