Abstract:Polydiallylorthophthalate, PDOP, of low molecular weight and low molecular weight dispersivity has been prepared and investigated as a negative resist for electron‐beam, X‐ray and ultraviolet lithographies. The resist polymers were prepared by a conventional fractional precipitation method. It has been found that a high resolution pattern is obtained by using a molecular weight of 1 × 104 and an Mw/Mn < 2. This gives a good solubility difference between the exposed and unexposed portions in the developer. Reso… Show more
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