2022
DOI: 10.1016/j.vacuum.2021.110739
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Polycrystalline and high purity SnO2 films by plasma-enhanced atomic layer deposition using H2O plasma at very low temperatures of 60–90 °C

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Cited by 1 publication
(2 citation statements)
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“…Therefore, for mixed-phase compounds an asymmetric widening of the overall line profiles is observed rather than the appearance of additional resolved peaks [27,28]. The Sn 3d 5/2 XPS binding energy of 486.9 eV in our data also aligns well with stoichiometric SnO 2 as reported previously [27][28][29][30][31][32][33][34], indicating a single-phase Sn 4+ compound in our samples.…”
Section: Film Structuresupporting
confidence: 89%
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“…Therefore, for mixed-phase compounds an asymmetric widening of the overall line profiles is observed rather than the appearance of additional resolved peaks [27,28]. The Sn 3d 5/2 XPS binding energy of 486.9 eV in our data also aligns well with stoichiometric SnO 2 as reported previously [27][28][29][30][31][32][33][34], indicating a single-phase Sn 4+ compound in our samples.…”
Section: Film Structuresupporting
confidence: 89%
“…In O 1s XPS (Figure 10b), the dominant peak at 530.7 eV also aligns well with values earlier reported for SnO 2 [32][33][34]. A bit surprisingly, the spectra obtained from the sample grown at the higher deposition temperature revealed a somewhat more intense peak at the binding energy typical of surface OH (Figure 10b).…”
Section: Film Structuresupporting
confidence: 89%