Poly(diarylsilmethylene)s, II. Thermal and mechanical properties1

Abstract

Thermal and mechanical properties of poly(diarylsilmethylene)s (PDArSMs) with phenyl, m‐tolyl or p‐tolyl substituents on Si atoms were investigated. According to the TG‐DTA, poly(diphenylsilmethylene) (PDPSM) remained almost unchanged in weight up to about 400°C, and showed two‐step weight loss in the temperature range between ca. 400 and 700°C in an air atmosphere. The first decomposition step seems assignable to elimination of aryl groups while the second one is presumably due to oxidative decomposition which is evident from a large exothermic peak in the DTA trace. Thermostability of PDArSMs with tolyl groups were comparable to that of PDPSM when the measurement was conducted under nitrogen, whereas the polymers having tolyl substituents were highly thermally unstable in air compared with PDPSM. These polymers exhibited a gain in weight accompanied with a violent exothermic reaction in the early stage of thermal decomposition in air. This thermal instability of the tolyl‐substituted polymers can be explained by high sensitivity of the tolyl groups toward oxidative decomposition. Analysis of pyrolyzed products of PDArSMs suggested that these polymers underwent radical cleavage of Si‐aryl bonds to provide network materials which can be precursors for Si‐containing ceramics. Mechanical properties of PDPSM are also discussed. © 1996 John Wiley & Sons, Inc.

Fabrication of Poly(diphenylsilylenemethylene) and Poly(diphenylsiloxane) Thin Films Using Fine Metal Particles

“…Consequently, it is impossible to apply the methods currently used for polymer thin film preparation, like spin coating. In addition, melting chemically synthesized powders to further deposit them on a substrate is not recommended, because some degradation related to removal of the phenyl group was reported at temperatures slightly above the polymer melting points …”

New Synthesis Method of Poly(diphenylsilylenemethylene) Thin Films

“…Poly(silylenemethylene)s (PSMs) have been studied for nearly 3 decades, largely due to their thermal and mechanical and pyrolytic properties . Among the PSM family, poly(diphenylsilylenemethylene) (PDPhSM) is of particular interest because of its high thermal stability (over 670 K) . Recently, some unique light emission properties of PDPhSM induced by UV laser irradiation were observed .…”

“…1 Among the PSM family, poly(diphenylsilylenemethylene) (PDPhSM) is of particular interest because of its high thermal stability (over 670 K). 2 Recently, some unique light emission properties of PDPhSM induced by UV laser irradiation were observed. 3 These properties show promise for applications such as polymer-based optical devices.…”

Poly(silylenemethylene)‐based polymer blends. III. Synthesis and properties of polymer blends containing siloxane‐crosslinked poly(silylenemethylene)s

“…Poly(methylphenylsilylene methylene) (PMPSM) is a thermally stable polymer with good tensile properties,5 but the solvent resistance is poor because it is an amorphous material. However, the thermal stability and solvent resistance of poly(diphenylsilylenemethylene) (PDPSM) are very good, but the material is brittle in nature because of its high crystallinity 6. Therefore, an improvement in the solvent resistance of PMPSM or in the toughness of PDPSM is necessary to develop new good materials.…”