A small amount of Cu 2þ ions was added to the activation bath used for pretreatment of the plating process of an AZ31 Mg alloy. In the activation process, a small amount of Cu was deposited at high density on the substrate surface accompanying Mg dissolution (Cu pretreatment). These Cu deposits acted as nucleation seeds for Zn deposition in the following zincate process and provided a uniform and dense Zn layer almost completely covering the substrate. The Cu layer electroplated on this zincated substrate showed considerable improvement in density and uniformity compared with those of the sample without Cu pretreatment. Crosssectional SEM observation revealed that a less-defective interface between the Cu layer and substrate was obtained for the Cu-prepared sample. This structure also contributed to the improvement of adhesion strength. The mechanism of this improvement was investigated using electrochemical measurement and scanning electron microscopy observation with energy dispersive X-ray spectroscopy analysis. Owing to their superior strength, light weight and rich natural resources, Mg and its alloys are attractive materials in various applications. Unfortunately, the surface of Mg is easily covered with a thick oxide or hydroxide layer with a high electric resistance, which may not be suitable for some applications such as electronic devices. Therefore, it is important to establish a plating method that can produce functional coatings on Mg alloys such as corrosion-resistant and electrically conductive coatings with sufficient adhesivity.Since a thick passivation film is formed on Mg under an ambient atmosphere, pretreatment is necessary to remove the surface layer and to suppress its reformation prior to the plating process. [1][2][3][4][5] It is also important to obtain a uniform surface condition on Mg alloys for plating because intermetallic compounds such as Mg x Al y are formed at grain boundaries. Despite these difficulties, electroplating can provide potentially uniform coatings with good corrosion resistance for Mg alloys by using zincate pretreatment.6-11 Application of zincate pretreatment to Mg alloys, however, has sometimes resulted in non-uniform Zn deposition, probably due to non-uniform dissolution of the substrate during the zincate process.11 In the case of Al and its alloys, zincate pretreatment has also been optimized to obtain uniform Zn deposition. The effectiveness of various methods for reducing the influence of intermetallic compounds of Al alloys in an electroless plating process has been studied. These methods include etching treatment, 12 formation of a seed layer by using a dry process, 13-17 and other techniques. Our group previously reported that addition of a small amount of Cu ions to the etching bath can dramatically improve the uniformity of Zn deposits on Al-Si alloys in the double zincate process because Cu deposits formed in the etching process acted as nucleation seeds for Zn deposition (Cu pretreatment).18 Since Cu pretreatment was effective for obtaining uniform Zn...