2015
DOI: 10.1021/acs.jpcc.5b06725
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Plasma Treatment Effects on Molecular Structures at Dense and Porous Low-k SiCOH Film Surfaces and Buried Interfaces

Abstract: The effects of oxygen plasma treatment on molecular structures at low-k organosilicate (SiCOH) film surfaces and buried interfaces were investigated using sum frequency generation (SFG) vibrational spectroscopy and Raman spectroscopy. SFG and Raman spectra were acquired from pristine and plasma-treated low-k SiCOH films to characterize the interfacial and bulk molecular structures of the films before and after plasma treatment. Two SiCOH films with similar molecular structures but different porosities were inv… Show more

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Cited by 11 publications
(23 citation statements)
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“…SFG was used to investigate molecular structures of surfaces and buried interfaces of pSiCOH films on Si provided by Intel. 170 The thin film thickness is 100 nm for all the samples; therefore, the SFG ssp spectra collected from these samples are dominated by the contribution from the surfaces, while the SFG ppp spectra contain signal contributions from both the surfaces and the buried interfaces. Two samples with a similar structure but different porosities (7% and 25%) before and after oxygen plasma treatment were examined to understand how sample porosity influences the plasma treatment effect on pSiCOH film surface and interfacial structures.…”
Section: (11f)mentioning
confidence: 99%
See 2 more Smart Citations
“…SFG was used to investigate molecular structures of surfaces and buried interfaces of pSiCOH films on Si provided by Intel. 170 The thin film thickness is 100 nm for all the samples; therefore, the SFG ssp spectra collected from these samples are dominated by the contribution from the surfaces, while the SFG ppp spectra contain signal contributions from both the surfaces and the buried interfaces. Two samples with a similar structure but different porosities (7% and 25%) before and after oxygen plasma treatment were examined to understand how sample porosity influences the plasma treatment effect on pSiCOH film surface and interfacial structures.…”
Section: (11f)mentioning
confidence: 99%
“…Raman spectroscopy was used as a supplemental tool to show that the bulk film structures of both samples were not changed under the plasma treatment. 170 A similar approach was applied to study the low-k SiCOH samples provided by IBM. 172 This time, the SiCOH thin film was plasma treated with ammonia for 18 s. It was found from the SFG ssp spectra that the SiCOH film surface was altered by the ammonia plasma treatment, the surface methyl groups tilted more toward the surface, and 40% of the surface methyl groups were removed by plasma.…”
Section: (11f)mentioning
confidence: 99%
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“…However, uncontrolled plasma treatment may harm the porous low- k films. The surface and interface of plasma-treated PMSQ materials were studied using SFG-VS. 101,112 It was found that the surface structure of dense organosilicate films was more resilient to plasma treatment than that of the porous films. 112…”
Section: Understanding Adhesion Mechanism At Polymer Interfacesmentioning
confidence: 99%
“…One example is the interfaces between polymer and adhesives, which have been reviewed previously. [102][103][104][105][106][107][108][109][110][111][112][113][114][115][116][117][118][119][120] Another example is the rubbing and sliding between two polymers, which will be discussed in the following section.…”
Section: Interface Between Polymer and Polymermentioning
confidence: 99%