Plasma techniques for nanostructured carbon materials synthesis. A case study: carbon nanowall growth by low pressure expanding RF plasma

Vizireanu, Sorin; Stoica, Silviu Daniel; Luculescu, C.; Nistor, L. C.; Mitu, B.; Dinescu, Gheorghe

doi:10.1088/0963-0252/19/3/034016

Cited by 110 publications

(84 citation statements)

References 71 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Thus, the important role of C 2 in the CNW growth, especially for the formation of critical nuclei, has been mentioned by many groups (Teii et al 2009;Mori et al 2011). In the meanwhile, a series of experimental results on mixing H 2 as an etchant into CH 4 suggested that clusters of carbon C n H þ x (n C 2; x = 1, 2, 3) are the building species for the CNW growth, which was based on the OES and mass spectroscopy measurements (Vizireanu et al 2010). Studies on the CNW synthesis using a TM/MW plasma reactor with the feedstock gas of CH 4 /N 2 mixture, on the other hand, indicated the advantage of using N 2 instead of H 2 in the removal of excess a-C (Shang et al 2008;Soin et al 2011).…”

Section: A Variety Of Plasma Sources and Parameters For Synthesizing mentioning

confidence: 99%

Nanocarbon materials fabricated using plasmas

Hatakeyama

2017

Rev. Mod. Plasma Phys.

View full text Add to dashboard Cite

Since the discovery of fullerenes more than three decades ago, new kinds of nanoscale materials of carbon allotropes called ''nanocarbons'' have so far been discovered or synthesized at successive intervals as cases such as carbon nanotubes, carbon nanohorns, graphene, carbon nanowalls, and a carbon nanobelt, while nanodiamonds were actually discovered before then. Their attractively excellent mechanical, physical, and chemical properties have driven researchers to continuously create one of the hottest frontiers in materials science and technology. While plasma states have often been involved in their discovery, on the other hand, plasma-based approaches to this exciting field originally hold promising and enormous potentials for advancing and expanding industrial/biomedical applications of nanocarbons of great diversity. This article provides an extensive overview on plasma-fabricated nanocarbon materials, where the term ''fabrication'' is defined as synthesis, functionalization, and assembly of devices to cover a wide range of issues associated with the step-by-step plasma processes. Specific attention has been paid to the comparative examination between plasma-based and non-plasma methods for fabricating the nanocarobons with an emphasis on the advantages of plasma processing, such as low-temperature/large-scale fabrication and diversitycarrying structure controllability. The review ends with current challenges and prospects including a ripple effect of the nanocarbon studies on the development of related novel nanomaterials such as transition metal dichalcogenides. It contains not only the latest progress in the field for cutting-edge scientists and engineers, but also the introductory guidance to non-specialists such as lower-class graduate students.& Rikizo Hatakeyama

show abstract

Section: A Variety Of Plasma Sources and Parameters For Synthesizing mentioning

confidence: 99%

Nanocarbon materials fabricated using plasmas

Hatakeyama

2017

Rev. Mod. Plasma Phys.

View full text Add to dashboard Cite

show abstract

“…Graphene [6][7][8] Carbon nanotube * 3,9 Activated carbon [10][11][12] in nanostructure ordering/patterning [32][33][34][35][36] due to the presence of energetic electrons, excited molecules and atoms, free radicals, photons, and other active species in the plasma region. Compared with T-CVD, PECVD growth is more complex.…”

Section: Propertiesmentioning

confidence: 99%

Review—Critical Considerations of High Quality Graphene Synthesized by Plasma-Enhanced Chemical Vapor Deposition for Electronic and Energy Storage Devices

Azam

Zulkapli

Dorah

et al. 2017

ECS J. Solid State Sci. Technol.

View full text Add to dashboard Cite

Graphene is a promising electrode material not only due to its intrinsic properties like good electrical conductivity, high mechanical strength and high chemical stability, but also because of its high theoretical surface area of 2630 m 2 g −1 . In this report, the effect of CVD parameters to the growth of high quality graphene on metal substrates by using plasma enhanced chemical vapor deposition (PECVD) was extensively studied. Interestingly, synthesizing high quality graphene by PECVD technique is not only depending on the CVD parameters, but also depending on the catalysts and its plasma sources. It was found that Ni and Cu are the most favored metal catalysts for PECVD graphene growth. With high solubility of carbon (> 0.1 at. %), Ni effectively promote the growth of multilayer graphene by PECVD. However, large-area synthesis has made relatively inexpensive Cu as one of the most attractive substrates for monolayer graphene growth. Further details on the potential use of different transition metal catalysts in synthesizing graphene and consequently the specific usage of graphene based devices are discussed in this report.

show abstract

“…Low temperature PE-CVD offers even some advantages over conventional CVD growth techniques, as it results in vertical alignment and ordering of the carbon nanostructures, due to the electric fields normal to the growth surface [7,70,71]. As mentioned by Denysenko and Ostrikov [72], it is commonly accepted that the growth and structure of CNTs, CNFs and related carbon nanostructures is determined on the surface and within the metal catalyst nanoparticle.…”

Section: (B) Cnts and Related Structuresmentioning

confidence: 99%

Computer modelling of the plasma chemistry and plasma-based growth mechanisms for nanostructured materials

Bogaerts¹,

Eckert²,

Mao³

et al. 2011

J. Phys. D: Appl. Phys.

View full text Add to dashboard Cite

In this review paper, an overview is given of different modeling efforts for plasmas used for the formation and growth of nanostructured materials. This includes both the plasma chemistry, providing information on the precursors for nanostructure formation, as well as the growth processes itself. We limit ourselves to carbon (and silicon) nanostructures. Examples of the plasma modeling comprise nanoparticle formation in silane and hydrocarbon plasmas, as well as the plasma chemistry giving rise to carbon nanostructure formation, such as (ultra)nanocrystalline diamond ((U)NCD) and carbon nanotubes (CNTs). The second part of the paper deals with the simulation of the (plasma-based) growth mechanisms of the same carbon nanostructures, i.e., (U)NCD and CNTs, both by mechanistic modeling and detailed atomistic simulations. IntroductionLow temperature plasmas are playing an increasingly important role for the formation and growth of nanostructures and nanostructured materials (e.g., [1][2][3][4][5][6][7]). To improve the performance of these plasma growth processes, a good insight is desired in the plasma and in the interaction with the growing nanostructures. This insight can be obtained by experimental research, but the latter is not always straightforward, in view of the small dimensions of the nanomaterials and the possible disturbance of the plasma characteristics, e.g., when introducing a probe. Therefore, computer simulations can be very useful to assist in the experimental developments.In the present paper, we will give an overview of different modeling efforts that have been presented in the literature for plasmas used for nanostructure formation. This includes two different aspects. First, a thorough understanding of the plasma behavior is needed. This comprises background gas flow and heating (i.e., fluid dynamics), gas breakdown, transport and heating of the electrons and the so-called heavy particles, as well as the plasma chemistry, i.e., creation and destruction of the various plasma species by chemical reactions. Modeling of the plasma chemistry can give indications on which species are important precursors for the growth of nanostructured materials and how the plasma operating conditions can be tuned to optimize the growth process. Therefore, in this paper we will mainly focus on the plasma chemistry modeling. Several plasma modeling approaches exist in literature, such as analytical models, zero-dimensional (0D) chemical kinetics simulations, fluid models (describing the chemical kinetics as well as fluid dynamics), solving the Boltzmann transport equation, Monte Carlo (MC) and particle-in-cell (PIC)-MC simulations, as well as hybrid methods, combining the above (e.g., MC + fluid) models. For describing the plasma chemistry, the 0D chemical kinetics approach is often applied, as it can take into account a large number of different species and reactions without too much computational effort. However, it assumes a spatially uniform plasma composition and does not consider transport of the plasm...

show abstract

Plasma techniques for nanostructured carbon materials synthesis. A case study: carbon nanowall growth by low pressure expanding RF plasma

Cited by 110 publications

References 71 publications

Nanocarbon materials fabricated using plasmas

Nanocarbon materials fabricated using plasmas

Review—Critical Considerations of High Quality Graphene Synthesized by Plasma-Enhanced Chemical Vapor Deposition for Electronic and Energy Storage Devices

Computer modelling of the plasma chemistry and plasma-based growth mechanisms for nanostructured materials

Contact Info

Product

Resources

About