1995
DOI: 10.1016/0257-8972(95)08316-2
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Plasma surface treatment and PACVD on Ti alloys for surgical implants

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Cited by 73 publications
(34 citation statements)
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“…5c). Accelerated grain growth is often reported for nitrided samples treated above 900°C [38] and therefore treatments at temperatures approaching this value are likely to exhibit an overall inferior performance.…”
Section: Fatigue Test Resultsmentioning
confidence: 99%
“…5c). Accelerated grain growth is often reported for nitrided samples treated above 900°C [38] and therefore treatments at temperatures approaching this value are likely to exhibit an overall inferior performance.…”
Section: Fatigue Test Resultsmentioning
confidence: 99%
“…However, occasionally the use of c.p. Ti as implant is problematic as long as it presents low wear resistance 5,6 . A crucial issue concerning the removal of the bacterial plaque from the transmucous dental implant cylinders is the possibility of damage by the routine instruments, such as stainless steel Gracey scaler, sonic and ultrasonic apparatus [7][8][9][10] .…”
Section: Introductionmentioning
confidence: 99%
“…In fact, this has been the subject of several investigations in clinical dentistry 4 . Among the surface treatment techniques, the most reported are: plasma assisted chemical vapor deposition 5 , conventional ion implantation [15][16][17][18][19] , plasma source nitrogen ion implantation 20 , conventional nitriding 21 , conventional plasma nitriding 22,23 , intensified plasma ion nitriding 24 , physical and chemical vapor deposition TiN films [25][26][27][28] , powder immersion reaction assisted coating method 29 , laser heating 30,31 as well as combined techniques 32,33 . Improvement on the mechanical and tribological properties of c.p.…”
Section: Introductionmentioning
confidence: 99%
“…But reports on the wear behaviour of Ti thin layers are rare. Since titanium nitrides are hard biocompatible materials [20][21][22] with excellent resistance to abrasion, more advanced processing methods have been developed in order to achieve a nitride layer on the surface of materials. At the presence of nitride in plasma [23], nitrogen atoms diffuse into the titanium matrix, forming a layer of TiN and Ti 2 N compounds, usually followed by a deeper diffusion layer.…”
mentioning
confidence: 99%