2018
DOI: 10.1063/1.5016262
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Plasma-surface interaction in negative hydrogen ion sources

Abstract: A negative hydrogen ion source delivers more beam current when Cs is introduced to the discharge, but a continuous operation of the source reduces the beam current until more Cs is added to the source. This behavior can be explained by adsorption and ion induced desorption of Cs atoms on the plasma grid surface of the ion source. The interaction between the ion source plasma and the plasma grid surface of a negative hydrogen ion source is discussed in correlation to the Cs consumption of the ion source. The re… Show more

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Cited by 12 publications
(1 citation statement)
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“…This enhances Cs consumption rates forming Cs alloy that do not decompose to atomic Cs; this Cs does not reduce the work function of the PG [153]. The sputtered impurities can be also ionized in the plasma to be accelerated and sputter out Cs atoms on PG [154]. There are also positive effects due to sputtering: remove impurities embedded into the Cs surface and thus decrease the surface work function.…”
Section: Research To Meet Requirements For Iter Nbimentioning
confidence: 99%
“…This enhances Cs consumption rates forming Cs alloy that do not decompose to atomic Cs; this Cs does not reduce the work function of the PG [153]. The sputtered impurities can be also ionized in the plasma to be accelerated and sputter out Cs atoms on PG [154]. There are also positive effects due to sputtering: remove impurities embedded into the Cs surface and thus decrease the surface work function.…”
Section: Research To Meet Requirements For Iter Nbimentioning
confidence: 99%