Plasma Sources and Reactor Configurations

Colpo, Pascal; Meziani, T.; Rossi, François

doi:10.1002/9783527622184.ch2

Cited by 2 publications

(9 citation statements)

References 56 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Indirect efficiency assessment obtained by comparing the ion current with the probe installed in the chamber showed that (at the same input power) the ion current in FMICP with a 4 mm window is about four times larger than in the ICP with 25 mm window. A nearly similar result has been obtained in [12] for a large area (1 × 1 m 2 ) FMICP with embedded coils and a thin window. However, to what extent this difference is attributed to the thin window or/and to the ferromagnetic core remains unclear.…”

Section: Fmicps With Open Ferrite Coresupporting

confidence: 83%

“…Electrical and plasma characteristics of an ICP with a top flat window and the coupler formed with a coil embedded in a ferromagnetic plate, as shown in figure 22, were reported in [9,12]. The ICP parameters were measured at a driving frequency of 13.56 MHz in the input power range between 100 and 700 W, with and without the ferromagnetic core.…”

Section: Fmicps With Open Ferrite Corementioning

confidence: 99%

“…Conceptually this approach is similar to the one used in [9,12,34]. The main idea was to reduce the magnetic resistance of the magnetic field path around the antenna conductor, in order to enhance the magnetic induction between ferrite poles in the gap facing the plasma.…”

Section: Fmicps With Open Ferrite Corementioning

confidence: 99%

“…The main idea was to reduce the magnetic resistance of the magnetic field path around the antenna conductor, in order to enhance the magnetic induction between ferrite poles in the gap facing the plasma. But using a thin wall quartz tube (instead of a thin large window in [9,12]) to separate the coupler from the plasma simplifies the antenna construction and provides a more reliable mechanical integrity.…”

Section: Fmicps With Open Ferrite Corementioning

confidence: 99%

“…In order to overcome the above-mentioned problems and to satisfy the requirement for uniform processing of large wafers with high speed, the following two design concepts have been proposed: (1) a low-frequency ICP enhanced by a ferromagnetic core (FMICP) [9][10][11][12] and (2) an ICP having multiple antennas to realize distributed rf excitations [13][14][15]. The first design concept has been inspired by the extensive research experience in the lighting industry.…”

Section: Introductionmentioning

confidence: 99%

See 4 more Smart Citations

Ferromagnetic enhanced inductive plasma sources

Godyak¹

2013

J. Phys. D: Appl. Phys.

View full text Add to dashboard Cite

The subject of this paper is the review of inductively coupled plasma (ICP) sources enhanced with ferromagnetic cores, FMICP, found in various applications, including plasma fusion, space propulsion, light sources, plasma chemistry and plasma processing of materials. The history of FMICP, early attempts for their realization, some recent developments and examples of successful FMICP devices are given here. A comparative study of FMICPs with conventional ICPs demonstrates their certain advantages in power transfer efficiency, power factor and their ability to operate without rf plasma potentials at low plasma densities and with small gaps, while effectively controlling plasma density profile.

show abstract

Section: Fmicps With Open Ferrite Coresupporting

confidence: 83%

Section: Fmicps With Open Ferrite Corementioning

confidence: 99%

Section: Fmicps With Open Ferrite Corementioning

confidence: 99%

Section: Fmicps With Open Ferrite Corementioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 3 more Smart Citations

Ferromagnetic enhanced inductive plasma sources

Godyak¹

2013

J. Phys. D: Appl. Phys.

View full text Add to dashboard Cite

show abstract

Modeling Approach and Analysis of the Structural Parameters of an Inductively Coupled Plasma Etcher Based on a Regression Orthogonal Design

Cheng¹,

Zhu²,

Ji³

2012

Plasma Sci. Technol.

View full text Add to dashboard Cite

The geometry of an inductively coupled plasma (ICP) etcher is usually considered to be an important factor for determining both plasma and process uniformity over a large wafer. During the past few decades, these parameters were determined by the "trial and error" method, resulting in wastes of time and funds. In this paper, a new approach of regression orthogonal design with plasma simulation experiments is proposed to investigate the sensitivity of the structural parameters on the uniformity of plasma characteristics. The tool for simulating plasma is CFD-ACE+, which is commercial multi-physical modeling software that has been proven to be accurate for plasma simulation. The simulated experimental results are analyzed to get a regression equation on three structural parameters. Through this equation, engineers can compute the uniformity of the electron number density rapidly without modeling by CFD-ACE+. An optimization performed at the end produces good results.

show abstract

Plasma Sources and Reactor Configurations

Cited by 2 publications

References 56 publications

Ferromagnetic enhanced inductive plasma sources

Ferromagnetic enhanced inductive plasma sources

Modeling Approach and Analysis of the Structural Parameters of an Inductively Coupled Plasma Etcher Based on a Regression Orthogonal Design

Contact Info

Product

Resources

About