2004
DOI: 10.1016/j.surfcoat.2004.04.045
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Plasma source ion implantation using high-power pulsed RF plasma

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Cited by 3 publications
(2 citation statements)
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“…RF-generated plasma is a mul-tifunctional tool for etching of the surface or plasma-enhanced chemical vapor deposition, with thermal energy of the electrons being few eV, bringing the atoms to excited state and inducing chemical reaction. Still, the temperature of the electron gas remains low (near room-temperature), allowing modifications of sensitive surfaces, such as biopolymers [22,23]. The closed reactor system offers the possibility of gas capturing and recycling, preventing harmful gas exhaust into the environment [24,25].…”
Section: Introductionmentioning
confidence: 99%
“…RF-generated plasma is a mul-tifunctional tool for etching of the surface or plasma-enhanced chemical vapor deposition, with thermal energy of the electrons being few eV, bringing the atoms to excited state and inducing chemical reaction. Still, the temperature of the electron gas remains low (near room-temperature), allowing modifications of sensitive surfaces, such as biopolymers [22,23]. The closed reactor system offers the possibility of gas capturing and recycling, preventing harmful gas exhaust into the environment [24,25].…”
Section: Introductionmentioning
confidence: 99%
“…They employed a main control system software design method based on VHDL for welding process timing and welding arc stability control. The welding quality was found to be satisfactory [27]. At the South China University of Technology, Xiaoming Lu and his team designed a complete software and hardware system using DSP and developed a digital MIG welding power source.…”
Section: Figure 8 Structure Diagram Of Inverter Arc Welding Machine P...mentioning
confidence: 99%