2022
DOI: 10.3390/coatings12111607
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Plasma–Solution Junction for the Formation of Carbon Material

Abstract: The solution plasma process (SPP) can provide a low-temperature reaction field, leading to an effective synthesis of N-doped graphene with a high N content and well-structured planar structure. However, the interactions at the plasma–solution interface have not been well understood; therefore, it needs to be urgently explored to achieve the modulation of the SPP. Here, to address the knowledge gap, we experimentally determined the physical parameters of the spital distribution in the plasma phase, plasma–gas p… Show more

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Cited by 2 publications
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“…Niu et al [133] suggest another approach based on the assumption that plasma can act similarly to semiconductors. They proposed an energy band diagram of the plasma-solution junction.…”
Section: Dopingmentioning
confidence: 99%
“…Niu et al [133] suggest another approach based on the assumption that plasma can act similarly to semiconductors. They proposed an energy band diagram of the plasma-solution junction.…”
Section: Dopingmentioning
confidence: 99%