Plasma polymerization in the design of new materials: looking through the lens of maleic anhydride plasma polymers

Oliveira, Jamerson Carneiro de; Brioude, Michel de Meireles; Airoudj, Aissam; Gall, Florence Bally‐Le; Roucoules, Vincent

doi:10.1016/j.mtchem.2021.100646

Cited by 7 publications

(4 citation statements)

References 104 publications

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“…In general, plasma activation is a direct plasma treatment method that can efficiently create desired functional groups on a targeted surface [59]. Plasma polymerization is a specific polymeric coating deposition technique that offers possibilities for tailoring surface chemistry combined with controlled surface morphology [60,61]. Plasma sputtering is known as a highly effective technique for the deposition of hard nanocomposite coatings on various materials [62], whereas nanoscale control of the surface morphology can be achieved with the use of plasma etching [63].…”

Section: Key Features Of Plasma Processing For Surface Wettability Co...mentioning

confidence: 99%

Plasma-controlled surface wettability: recent advances and future applications

Nikiforov

Hegemann

et al. 2022

International Materials Reviews

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Materials with the desirable surface wettability are of key importance in diverse applications. However, most of the existing chemical processes used for surface wettability control are often energy-inefficient, pollute the environment, and rely on harsh processing conditions. Therefore, highly-selective, green, and low-cost alternative fabrication techniques are in urgent demand. Low-temperature plasma processing is one such promising approach that satisfies the above requirements. In this review, we present recent advances in plasma processing to control surface wettability for diverse emerging applications in the environment, energy, and biomedicine fields. The underlying mechanisms of the plasma surface engineering, key features of the fabrication processes, and water-surface interactions are discussed. This review aims to guide further development of the plasma processing to effectively control the surface wettability of various surfaces. This effort is poised to contribute to the development of advanced functional materials targeting a broad range of applications.

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Section: Key Features Of Plasma Processing For Surface Wettability Co...mentioning

confidence: 99%

Plasma-controlled surface wettability: recent advances and future applications

Nikiforov

Hegemann

et al. 2022

International Materials Reviews

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“…Plasma polymerization is a simple and attractive technique for depositing thin polymeric lms on various substrate types in a dry process. 19,20 Plasma-polymerized lms (PPFs) are unique because they are highly cross-linked, pinhole-free, and chemically stable. Plasma polymerization has been widely employed in bioanalytical applications, including the enhancement of cell adhesion and proliferation, [21][22][23] DNA arrays, 24,25 glucose biosensors, 26,27 and immunosensors.…”

Section: Introductionmentioning

confidence: 99%

Characterization of plasma polymerized acetonitrile film for fluorescence enhancement and its application to aptamer-based sandwich assay

Yano,

Matsuie,

Sato

et al. 2024

Anal. Methods

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“…Plasma polymerization is a versatile technique to produce a wide range of thin films on various substrates. [1][2][3][4] Plasma-polymerized thin films exhibit unique characteristics compared to conventionally polymerized ones, such as a higher degree of cross-linking, insolubility, thermal stability, and good adhesion to most substrates. [5][6][7][8] Therefore, these films are suitable for numerous industrial applications, including optics, electronics, and medical devices.…”

Section: Introductionmentioning

confidence: 99%

Control strategies for atmospheric pressure plasma polymerization of fluorinated silane thin films with antiadhesive properties

Laghi

Franco

Condorelli

et al. 2022

Plasma Processes & Polymers

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Finding proper strategies to control plasma polymerization processes is a crucial aspect to produce thin films with tailored characteristics. In this work, the validity of the Yasuda parameter W/FM (W: discharge power and FM: precursor feed rate) as a controlling parameter for a polymerization process assisted by an atmospheric pressure single electrode plasma jet and the aerosolized fluorinated silane precursor trimethoxy (3,3,3-trifluoropropyl) silane is demonstrated. The properties of thin films deposited under different W/FM values are discussed using attenuated total reflectance-Fourier transform infrared (ATR-FTIR) spectroscopy, X-ray photoelectron spectroscopy (XPS), water contact angle (WCA) measurements, and scanning electron microscopy (SEM). Results suggest the presence of two deposition domains as a function of W/FM (an energy-deficient domain and a monomer-deficient domain), each inducing coatings with different chemical and physical properties. Furthermore, coatings deposited under the same W/FM values exhibit similar characteristics regardless of the power and feed rate values

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Plasma polymerization in the design of new materials: looking through the lens of maleic anhydride plasma polymers

Cited by 7 publications

References 104 publications

Plasma-controlled surface wettability: recent advances and future applications

Plasma-controlled surface wettability: recent advances and future applications

Characterization of plasma polymerized acetonitrile film for fluorescence enhancement and its application to aptamer-based sandwich assay

Control strategies for atmospheric pressure plasma polymerization of fluorinated silane thin films with antiadhesive properties

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