2016
DOI: 10.1063/1.4960089
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Plasma mirrors for short pulse KrF lasers

Abstract: It is demonstrated for the first time that plasma mirrors can be successfully applied for KrF laser systems. High reflectivity up to 70% is achieved by optimization of the beam quality on the plasma mirror. The modest spectral shift and the good reflected beam quality allow its applicability for high power laser systems for which a new arrangement is suggested.

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Cited by 13 publications
(17 citation statements)
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“…The plasma mirror, PM technique has successfully been applied for the improvement of the temporal contrast [1][2][3][4][5][6]. A bottleneck is the damage of the hosting surface due to the concomitant ablation.…”
Section: Introductionmentioning
confidence: 99%
“…The plasma mirror, PM technique has successfully been applied for the improvement of the temporal contrast [1][2][3][4][5][6]. A bottleneck is the damage of the hosting surface due to the concomitant ablation.…”
Section: Introductionmentioning
confidence: 99%
“…For instance, a contrast improvement of 2-4 orders of magnitude can be achieved using a plasma mirror [5]-typically a glass substrate that reflects the focused beam. This technique, however, results in energy losses of 20-50% [5,17]. Additionally, as the reflected light pulses locally destroy the surface of the plasma mirror, a fresh spot has to be provided after each shot requiring a movable mirror holder and limiting the total number of shots.…”
Section: Introductionmentioning
confidence: 99%
“…above the plasma threshold) and saturates above 10 14 W/cm 2 remaining approximately constant up 10 16 W/cm 2 . The observed high reflectivity [9] which allows the direct applicability of the plasma mirror for KrF systems can be attributed mainly to the already good initial contrast. In the present case the intensity of the ASE pedestal of 15 ns duration on the target was less than 10 5 W/cm 2 .…”
Section: Experimental Arrangementmentioning
confidence: 90%
“…A high reflectivity, i.e. 70% efficiency was just recently obtained for laser pulses of 248 nm wavelength [9] which opens the possibility to its application in UV laser systems.…”
Section: Introductionmentioning
confidence: 93%
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