Plasma-ion beam source enhanced deposition system

Li, Guoqing; Liu, Cui; Li, Jianfeng; Zhang, Chengwu; Mu, Zhongfei; Long, Zhenhu

doi:10.1016/j.surfcoat.2004.07.040

Cited by 9 publications

(4 citation statements)

References 8 publications

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“…4.1.3 DC (Direct Current) Sputtering DC (direct current) sputtering [23] is a material deposition process used to coat substrate structures with thin films of different materials (Fig. 9).…”

Section: Study Of Plasma and Ion Beam Sputtering Processes 136mentioning

confidence: 99%

Study of Plasma and Ion Beam Sputtering Processes

M.M.Abdelrahman¹

2015

JPSA

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Abstract:The effects of plasma (ions, electrons) and other energetic particles are now widely used for substrate cleaning as well as to assist and control thin film growth and various applications. In this work, historical review of the plasma and its various types are given and described. Different types of gas discharge and plasma production are also discussed in detail. Furthermore, technique of ion beam extraction from a plasma source for sputtering process by using a suitable electrode is carefully studied and given. In further consequence, a general review about the physics and mechanism of sputtering processes is studied. Different types of sputtering techniques are investigated and clarified. Theoretical treatment for determination of sputtering yield for low and high atomic species elements as a function of energy from 100 to 5,000 eV are studied and discussed. Finally, various applications of plasma-and-ion beam sputtering will also be mentioned and discussed.

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Section: Study Of Plasma and Ion Beam Sputtering Processes 136mentioning

confidence: 99%

Study of Plasma and Ion Beam Sputtering Processes

M.M.Abdelrahman¹

2015

JPSA

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“…Therefore, high-quality CrN coatings have been prepared by pulsed dc magnetron sputtering [15,16], and the high-power pulsed magnetron sputtering has also been developed for deposition of CrN coatings [17,18]. It is known that low ionization efficiency in the plasma is a hurdle of magnetron sputtering; therefore, plasma or ion sources have been developed to improve ionization efficiency [19,20]. In particular, Wei et al reported dense and thick films of transition metal nitrides, including ZrN and TiN, by means of plasma-enhanced magnetron sputtering, where an electron source of thermal filament type is a key technology [21,22].…”

Section: Introductionmentioning

confidence: 99%

Structural and Mechanical Properties of CrN_xCoatings Deposited by Medium-Frequency Magnetron Sputtering with and without Ion Source Assistance

Tian

Yang

et al. 2011

Journal of Nanomaterials

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CrNxcoatings were deposited on Si (100) and WC-Co substrates by a home-made medium-frequency magnetron sputtering system with and without thermal filament ion source assistance. The structure and composition of the coatings were characterized by X-ray diffraction, atomic force microscopy, scanning electron microscopy, and transmission electron microscopy. The mechanical and tribological properties were assessed by microhardness and pin-on-disc testing. The ion source-assisted system showed a deposition rate of 3.88 μm/h, much higher than the value 2.2 μm/h without ion source assistance. The CrNxcoatings prepared with ion source assistance exhibited an increase in microhardness (up to 16.3 GPa) and adecrease in friction coefficient (down to 0.48) at the optimized cathode source-to-substrate distance.

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“…Magnesium alloy enjoys the reputation for 21century green engineering material due to its outstanding performance featuring low density, high specific strength, specific rigidity and specific elastic ratio, seeing a good application prospect in ordnance industry and space navigation, however, its low reference electrode potential and poor corrosion resistant performance restrict its wider application. Scientists home and abroad carried out a lot of surface treatment researches to resolve this problem [1][2][3][4]. Chromate conversion coating is limited since hexavalent chromium ion causes serious environment pollution even it underwent a very successful development.…”

Section: Introductionmentioning

confidence: 99%

Formation and Performance of Cerium Silane Mixture Conversion Coatings on AZ91 Magnesium Alloy

Chen

et al. 2011

AMR

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With soaking treatment, cerium and KH560 silane compound mixture conversion coating are formulated. Various means of analysis such as SEM, EDS, IR, Tafel and EIS were adopted to carry out analysis of surface pattern, element constitution and electrochemical corrosion for mixture conversion coatings of different immersion time. The result shows: When the mixture conversion coating of cerium and silane are formed, the cerium conversion coating takes the priority in generation. Silane conversion coating is mainly absorbed to the cracks of cerium coating, once some exposed base are found at the minor cracks of the silane coating, as a result, definitely cerium coating is generated to make up the exposed base. Therefore, the corrosion resistant capabilities of the mixture conversion coating are higher than pure cerium conversion coating and silane conversion coating.

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Plasma-ion beam source enhanced deposition system

Cited by 9 publications

References 8 publications

Study of Plasma and Ion Beam Sputtering Processes

Study of Plasma and Ion Beam Sputtering Processes

Structural and Mechanical Properties of CrN_xCoatings Deposited by Medium-Frequency Magnetron Sputtering with and without Ion Source Assistance

Formation and Performance of Cerium Silane Mixture Conversion Coatings on AZ91 Magnesium Alloy

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Plasma-ion beam source enhanced deposition system

Cited by 9 publications

References 8 publications

Study of Plasma and Ion Beam Sputtering Processes

Study of Plasma and Ion Beam Sputtering Processes

Structural and Mechanical Properties of CrNxCoatings Deposited by Medium-Frequency Magnetron Sputtering with and without Ion Source Assistance

Formation and Performance of Cerium Silane Mixture Conversion Coatings on AZ91 Magnesium Alloy

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Product

Resources

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Structural and Mechanical Properties of CrN_xCoatings Deposited by Medium-Frequency Magnetron Sputtering with and without Ion Source Assistance