Abstract:An on-wafer surface charging sensor was developed for real-time measurement of the local charging voltage during plasma processing. This sensor is based on a modified MOS capacitor structure with charging voltage built up between an electrode and the substrate across a thick oxide as an indicator of charging. An array of electrodes are designed to measure the local plasma charging condition across the wafer. The processes needed for this sensor manufacturing are fully compatible with present CMOS processes. Co… Show more
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