Plasma induced by pulsed laser and fabrication of silicon nanostructures

Abstract

It is interesting that in preparing process of nanosilicon by pulsed laser, the periodic diffraction pattern from plasmonic lattice structure in the Purcell cavity due to interaction between plasmons and photons is observed. This kind of plasmonic lattice structure confined in the cavity may be similar to the Wigner crystal structure. Emission manipulation on Si nanostructures fabricated by the plasmonic wave induced from pulsed laser is studied by using photoluminescence spectroscopy. The electronic localized states and surface bonding are characterized by several emission bands peaked near 600 nm and 700 nm on samples prepared in oxygen or nitrogen environment. The electroluminescence wavelength is measured in the telecom window on silicon film coated by ytterbium. The enhanced emission originates from surface localized states in band gap due to broken symmetry from some bonds on surface bulges produced by plasmonic wave in the cavity.

Theoretical study of micro-optical structure fabrication based on sample rotation and two-laser-beam interference

“…However, as regards to micro-structure fabrication, including periodic onedimensional (1D) and two-dimensional (2D) structures, the most commonly used method is laser interference lithography (LIL). [17][18][19][20][21][22] For example, Jiang et al fabricated 1D and 2D superhydrophobic graphene surfaces by means of two-laserbeam interference; [23] Xuan et al obtained periodic triangle truncated pyramid arrays using an LIL system; [24] and motheye structures were fabricated on silicon via six-laser-beam interference lithography by Xu et al [25] In general, two-laser-beam interference can be used to fabricate simple periodic 1D micro-optical structures. For more complex structures, additional laser beams may be required; [26,27] however, this may complicate the optical devices and increase the operation difficulty.…”