Plasma Impedance Characteristics of Radio Frequency and Very High-Frequency Magnetron Discharges

Liu, Xiyue; Ye, Chao; Wang, Xiangying; Zhang, Su; Zhu, Min; Jiang, Amin

doi:10.1109/tps.2019.2958317

Cited by 2 publications

(1 citation statement)

References 24 publications

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“…The wall of the chamber was electrically grounded. The discharge voltage and sputtering power for the fundamental frequencies of 13.56 MHz, 27.12 MHz and 60 MHz were measured using an Impedans Octiv Suite V-I probe [22,23], which was connected between the matching box and the Ag target. The base pressure of the magnetron sputtering system was less than 5 × 10 −4 Pa, evacuated with a 600 l/s turbo-molecular pump backed up with a mechanical pump.…”

Section: Methodsmentioning

confidence: 99%

Effect of gas pressure on ion energy at substrate side of Ag target radio-frequency and very-high-frequency magnetron sputtering discharge

Ni¹,

Ye²,

Yu³

et al. 2022

Plasma Sci. Technol.

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The effect of gas pressure on ion energy distribution at the substrate side of Ag target radio-frequency (RF) and very-high-frequency (VHF) magnetron sputtering discharge was investigated. At the lower pressure, the evolution of maximum ion energy (E) with the discharge voltage (V) varied with the excitation frequency, due to the joint contribution of the ion generation in the bulk plasma and the ion movement across the sheath related to the ion transit sheath time τi and RF period RF. At the higher pressure, the evolution of E-V relationships do not vary with the excitation frequency, due to the balance between the energy lost through collisions and the energy gained by acceleration in the electric field. Therefore, for the RF and VHF magnetron discharge, the lower gas pressure can have a clear influence on the E-V relationship.

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Section: Methodsmentioning

confidence: 99%