Plasma immersion ion implantation: A viable candidate for low cost purification of mc-Si by nanocavities?

Characterization and Validation of a-Si Magnetron-Sputtered Thin Films as Solid He Targets with High Stability for Nuclear Reactions

“…5−7 Helium has been reported to be insoluble in different metals and tends to accumulate forming small bubbles causing damage in nuclear reactors. 7 Also considerable interest was found in the use of these materials for microelectronics, where the cavities produced by the implanted He act as impurity getters, 8,9 or more recently in energy conversion or storage devices. 2,4,10…”

“…5−7 Helium has been reported to be insoluble in different metals and tends to accumulate forming small bubbles causing damage in nuclear reactors. 7 Also considerable interest was found in the use of these materials for microelectronics, where the cavities produced by the implanted He act as impurity getters, 8,9 or more recently in energy conversion or storage devices. 2,4,10 As an alternative route to top-down methods for producing porous materials, we have recently proposed a bottom-up methodology to grow porous silicon-based coatings, with closed porosity by magnetron sputtering.…”

“…Nanostructured thin films and surfaces obtained by low-energy helium plasma treatments or by He incorporation via magnetron sputtering have been paid attention as strategies to modify and optimize materials properties. − Irradiation of metals with light ions, and in particular He, has been a subject of study for many years due to its technological interest in nuclear reactor materials. − Helium has been reported to be insoluble in different metals and tends to accumulate forming small bubbles causing damage in nuclear reactors . Also considerable interest was found in the use of these materials for microelectronics, where the cavities produced by the implanted He act as impurity getters, , or more recently in energy conversion or storage devices. ,, …”