Plasma Physics 2010
DOI: 10.1007/978-3-642-10491-6_11
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Plasma Generation

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Cited by 4 publications
(2 citation statements)
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“…RF-generated plasma is a mul-tifunctional tool for etching of the surface or plasma-enhanced chemical vapor deposition, with thermal energy of the electrons being few eV, bringing the atoms to excited state and inducing chemical reaction. Still, the temperature of the electron gas remains low (near room-temperature), allowing modifications of sensitive surfaces, such as biopolymers [22,23]. The closed reactor system offers the possibility of gas capturing and recycling, preventing harmful gas exhaust into the environment [24,25].…”
Section: Introductionmentioning
confidence: 99%
“…RF-generated plasma is a mul-tifunctional tool for etching of the surface or plasma-enhanced chemical vapor deposition, with thermal energy of the electrons being few eV, bringing the atoms to excited state and inducing chemical reaction. Still, the temperature of the electron gas remains low (near room-temperature), allowing modifications of sensitive surfaces, such as biopolymers [22,23]. The closed reactor system offers the possibility of gas capturing and recycling, preventing harmful gas exhaust into the environment [24,25].…”
Section: Introductionmentioning
confidence: 99%
“…The principal advantage of this method is that the material can be plasma treated for disinfection or decontamination with minimal physical damage. On the other hand, plasma generation can be carried out based on the target material's size dimensions (Niemira, 2012; Piel, 2017; Sakudo et al, 2020).…”
Section: Methods Of Low Temperature/ Non-thermal Plasma Generationmentioning
confidence: 99%