Plasma Etch of IGZO Thin Film and IGZO/SiO2 Interface Diffusion in Inductively Coupled CH4/Ar Plasmas
Jie Li,
Shreya Kundu,
Laurent Souriau
et al.
Abstract:In this work, the etching characteristics of InGaZnO4 (IGZO) thin films were systemically investigated in inductively coupled CH4/Ar plasmas with various gas ratios, bias voltages, and surface temperatures. The ion flux in the CH4/Ar plasmas was analyzed using bias power and voltage, whereas the relative densities of CH and H radicals were quantified through optical actinometry. The change in CH3 radical density was also estimated based on plasma kinetics analysis. The correlations between the plasma propertie… Show more
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