Plasma Enhanced CVD of Organosilicon Thin Films on Electrospun Polymer Nanofibers

Abstract

Organosilicon plasma polymers were deposited on polyvinyl alcohol and polyamide 6 electrospun nanofibers from hexamethyldisiloxane/Ar mixtures in low pressure (LP) radio frequency (RF) discharges with capacitive coupling and by cold RF plasma multi-jets working at atmospheric pressure (AP). The chemistry of the films deposited at LP was significantly varied by changing the RF power and process pressure as studied by X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy. Both the gas phase and surface processes contributed to the observed differences in the film properties. Significant variations in the nano/microstructure of the plasma polymers prepared by plasma processes at two different pressures were revealed by Atomic force microscopy and Scanning electron microscopy analysis. Modifications of the fibrous materials were investigated with respect to the wettability and structural properties. The values of the water contact angle were strongly influenced by both, the chemical composition of the deposited layers and the overall surface structure.

Design and evaluation of plasma polymer deposition on hollow objects by electrical plasma generated from the liquid surface

“…This should be confirmed by visible presence of absorbance peaks belongs to asymmetric and symmetric stretching of CH 3 (VII) at 2958 cm −1 , 2900 cm −1 and the asymmetric and symmetric stretching of CH 2 groups at 2927 cm −1 , 2856 cm −1 , respectively . Other characteristic bands of plasma polymerized HMDSO at 796 cm −1 , 840 cm −1 can be assigned to rocking vibrations in the SiCH 3 groups (V) and sharp band at 1256 cm −1 can be attributed to the symmetric bending of the CH 3 attached to Si (VI) .…”

“…Some authors reported that band at 2125 cm −1 , corresponding to presence of SiH stretching, shows the bonding of dissociated hydrogen to Si. These materials were prepared in experiments with low‐oxygen level in plasma gas . Although some samples show the presence of this vibration (especially in the region Area A—inner), unfortunately it cannot be further studied, due to the use of diamond crystal such as the ATR refractive material.…”

“…[27] This should be confirmed by visible presence of absorbance peaks belongs to asymmetric and symmetric stretching of CH 3 (VII) at 2958 cm −1 , 2900 cm −1 and the asymmetric and symmetric stretching of CH 2 groups at 2927 cm −1 , 2856 cm −1 , respectively. [44] Other characteristic bands of plasma polymerized HMDSO at 796 cm −1 , 840 cm −1 can be assigned to rocking vibrations in the SiCH 3 groups (V) and sharp band at 1256 cm −1 can be attributed to the symmetric bending of the CH 3 attached to Si (VI). [45] While the relatively weak absorption bands in the spectral range (VIII) at 1500-1300 cm −1 can be explained clearly as additional vibrations of various CH 2 and CH 3 groups, for example, Si─CH 2 ─Si (1358 cm −1 ) and SiCH 3 (1409 cm −1 ), [24] the identification of functional groups in the range 1800-1500 cm −1 (IX) is more difficult and were also associated with non-silica bonded oxygen.…”

“…These materials were prepared in experiments with low-oxygen level in plasma gas. [44] Although some samples show the presence of this vibration (especially in the region Area Ainner), unfortunately it cannot be further studied, due to the use of diamond crystal such as the ATR refractive material. Disadvantage of the diamond is the intrinsic absorption from 2300 to 1800 cm −1 which limits its usefulness in this region (only approx.…”

Thin insulating film deposition on copper by atmospheric‐pressure plasmas

“…This method is becoming increasingly important, since many elemental and compound material films, such as SiNx:H, SiO 2 , SiC, and SiSi 3 N 4 , can be prepared at low temperature. The film deposition using AP‐PECVD has been realized by atmospheric‐pressure dielectric barrier discharges (AP‐DBD), atmospheric‐pressure plasma jets (APPJ), and radio frequency glow discharges . Among them, parallel‐plate AP‐DBD shows good stability and scalability, and is among the most promising techniques for thin film deposition…”