Plasma-enhanced CVD of electrochromic materials

Kuypers, A. D.; Spee, C.I.M.A.; Linden, J.L.; Kirchner, Gerwin; Forsyth, J.F.; Mackor, A.

doi:10.1016/0257-8972(95)08294-8

Cited by 29 publications

(15 citation statements)

References 4 publications

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“…The reaction of this precursor with molecular oxygen at 300°C was proven to yield single phase V 2 O 5 . This crystalline phase was also observed as a dominant structure using PECVD at 207–72°C starting from VO(O i Pr) 3 under oxygen‐rich conditions …”

Section: Cvd Of Vanadium Oxidementioning

confidence: 92%

Vanadium Oxide Compounds: Structure, Properties, and Growth from the Gas Phase

Bahlawane¹,

Lenoble²

2014

Chemical Vapor Deposition

154

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The structure‐driven properties of vanadium oxide have inspired enormous developments in the last decades, especially as a smart material for energy, sensors, and optoelectronics. The large variety of stable and metastable structures of vanadium oxide is discussed, based on the calculated formation energies and a broad overview of their structure‐related properties. The established chemical deposition processes from the gas phase are reviewed with a particular emphasis on the implemented precursors and the obtained vanadium oxide phases. Although a significant fraction of relevant vanadium oxide compounds is achieved by these methods, there are still rewarding challenges related to their controlled elaboration and the investigation of their responsive properties.

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Section: Cvd Of Vanadium Oxidementioning

confidence: 92%

Vanadium Oxide Compounds: Structure, Properties, and Growth from the Gas Phase

Bahlawane¹,

Lenoble²

2014

Chemical Vapor Deposition

154

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“…Physical vapor deposition (PVD) techniques such as evaporation and sputtering are commonly employed for tungsten oxide film deposition. In comparison, PECVD has received relatively little attention for synthesis of tungsten oxide films [13][14][15][16][17]. Garg et al [18] reported that the advantages of PECVD over sputtering include higher deposition rates.…”

Section: Introductionmentioning

confidence: 97%

Electrochromic properties of novel atmospheric pressure plasma jet-synthesized-organotungsten oxide films for flexible electrochromic devices

Lin

Tsai

2010

Solar Energy Materials and Solar Cells

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“…Nickel oxide/hydroxide films can be commonly prepared by physical methods such as sputtering [9], vacuum evaporation [10] and electron beam deposition [11], or by chemical methods such as CVD [12], sol-gel deposition [13] and electrochemical deposition [14,15]. Nickel oxide/hydroxide films prepared by physical methods usually require expensive equipments and have the disadvantage of high energy consumption.…”

Section: Introductionmentioning

confidence: 99%